Semiconductor structure for electrostatic discharge protection
A semiconductor structure includes a silicon control rectifier (SCR) region and a NPN region adjacent to the SCR region. The silicon control rectifier (SCR) region includes a first p-well region, a first n-well region surrounded by the first p-well region and a first P+ region in the first p-well region and spaced apart from the first n-well region. The NPN region includes a second p-well region, a first N+ region, a second N+ region and a second P+ region. The first N+ region is coupled to the second p-well region and an electrostatic discharge source. The second N+ region is coupled to the second p-well region and spaced apart from the first N+ region. The second P+ region is disposed in the second p-well region and equipotentially connected to the first P+ region in the first p-well region.
1. A semiconductor structure, comprising:
a silicon control rectifier (SCR) region formed in a semiconductor substrate, and comprising:
a first p-well region;
a first n-well region surrounded by the first p-well region; and
a first P+ region in the first p-well region and spaced apart from the first n-well region;
a NPN region formed in the semiconductor substrate and adjacent to the SCR region, and comprising:
a second p-well region;
a first N+ region coupled to the second p-well region and an electrostatic discharge source;
a second N+ region coupled to the second p-well region and spaced apart from the first N+ region; and
a second P+ region in the second p-well region and equipotentially connected to the first P+ region in the first p-well region.
2. The semiconductor structure of claim 1 , wherein the SCR region further comprises a third P+ region disposed in the first n-well region and coupled to the electrostatic discharge source.
3. The semiconductor structure of claim 2 , wherein the third P+ region is equipotentially connected to the first N+ region.
4. The semiconductor structure of claim 1 , wherein the NPN region further comprises a first halo implant region directly coupled to the first N+ region, wherein the first halo implant region is p-type.
5. The semiconductor structure of claim 1 , wherein the NPN region further comprises a second halo implant region directly coupled to the second N+ region, wherein the second halo implant region is p-type.
6. The semiconductor structure of claim 1 , further comprising a second n-well region disposed between the SCR region and the NPN region.
7. The semiconductor structure of claim 1 , further comprising a metal line equipotentially interconnecting the second P+ region with the first P+ region.
8. The semiconductor structure of claim 1 , wherein the SCR region further comprises a third N+ region disposed in the first p-well region and coupled to a ground node.
9. The semiconductor structure of claim 8 , wherein the SCR region and the NPN region are configured to form a first electrostatic discharge (ESD) current path from the electrostatic discharge source to the third N+ region through the second p-well region of the NPN region.
10. The semiconductor structure of claim 8 , wherein the SCR region and the NPN region are configured to form a second electrostatic discharge (ESD) current path from the electrostatic discharge source to the third N+ region through the first n-well region of the silicon control rectifier (SCR) region.