IP Library Granted Patent US 10,541,027
Granted Patent B2
US 10,541,027 · App. 16/218,125 · Granted Jan 21, 2020

Multifunctional memory cells

Inventor: Arup Bhattacharyya (Essex Junction, VT)
Assignee: Micron Technology, Inc.
G11C14/0018G11C16/0466H01L27/10805H01L27/11568H01L28/40H01L29/2003H01L29/513H01L29/517H01L29/518H01L29/4966
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Quick Facts
Patent No.
US 10,541,027
App. No.
16/218,125
Granted
Jan 21, 2020
Kind
B2
Abstract

The present disclosure includes multifunctional memory cells. A number of embodiments include a charge transport element having an oxygen-rich silicon oxynitride material, a volatile charge storage element configured to store a first charge transported through the charge transport element, and a non-volatile charge storage element configured to store a second charge transported through the charge transport element, wherein the non-volatile charge storage element includes a gallium nitride material.

Claims (19)

1. An apparatus, comprising:

an array of memory cells, wherein each respective memory cell of the array includes:

a charge transport element; and

a charge storage element, wherein the charge storage element includes a number of alternating nitride materials and gallium nitride materials each configured to store a different charge transported through the charge storage element.

2. The apparatus of claim 1 , wherein the number of alternating nitride materials and gallium nitride materials each correspond to a different memory level.

3. The apparatus of claim 1 , wherein the number of alternating nitride materials and gallium nitride materials include:

a first nitride material adjacent the charge transport element;

a first gallium nitride material adjacent the first nitride material;

a second nitride material adjacent the first gallium nitride material; and

a second gallium nitride material adjacent the second nitride material.

4. The apparatus of claim 1 , wherein each respective memory cell of the array includes a charge blocking element configured to prevent leakage of each respective charge stored by the number of alternating nitride materials and gallium nitride materials.

5. The apparatus of claim 4 , wherein the charge blocking element includes:

a silicon-rich nitride material adjacent the charge storage element;

an aluminum oxide material adjacent the silicon-rich nitride material; and

a hafnium oxynitride material adjacent the aluminum oxide material.

6. The apparatus of claim 1 , wherein the charge transport element includes:

a first oxygen-rich silicon oxynitride material;

a second oxygen-rich silicon oxynitride material; and

a hafnium dioxide material between the first oxygen-rich silicon oxynitride material and the second oxygen-rich silicon oxynitride material.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 15, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 051026/0568 →
RELEASE OF SECURITY INTEREST Recorded Oct 14, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050718/0764 →
SUPPLEMENT NO. 11 TO PATENT SECURITY AGREEMENT Recorded Jan 16, 2019
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 048082/0860 →
SUPPLEMENT NO. 2 TO PATENT SECURITY AGREEMENT Recorded Jan 16, 2019
From: MICRON TECHNOLOGY, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 048082/0889 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 12, 2018
From: BHATTACHARYYA, ARUP
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047758/0889 →