Semiconductor device having diode devices with different barrier heights and manufacturing method thereof
The present disclosure provides a method of manufacturing a Schottky diode. The method includes: providing a substrate; forming a first well region in the substrate; defining a first portion and a second portion on a surface of the first well region and performing a first ion implantation on the first portion while keeping the second portion from being implanted; forming a first doped region by heating the substrate to cause dopant diffusion between the first portion and the second portion; and forming a metal-containing layer on the first doped region to obtain a Schottky barrier interface.
1. A method of manufacturing a semiconductor device, comprising:
providing a substrate;
forming a first well region and a second well region in the substrate;
disposing a photomask over the substrate, the photomask exposing a first portion of the first well region and a first portion of the second well region;
performing an ion implantation on the first portion of the first well region and the first portion of the second well region while keeping a second portion of the first well region and a second portion of the second well region from being implanted; and
forming a first doped region in the first well region and forming a second doped region in the second well region by heating the substrate.
2. The method according to claim 1 , further comprising forming a metal-containing layer on each of the first doped region and the second doped region to obtain a Schottky barrier interface.
3. The method according to claim 1 , wherein forming the first doped region and the second doped region comprises forming the first doped region and the second doped region by a single annealing operation.
4. A Schottky diode device, comprising:
a substrate having a first conductivity type;
a first well region having a second conductivity type disposed in the substrate; and
a first doped region having the second conductivity type in the first well region, the first doped region comprising a first portion and a second portion, and the first portion and the second portion having different doping concentrations,
wherein each of the first portion and the second portion comprises a plurality of strips.
5. The Schottky diode device according to claim 4 , further comprising a metal containing layer on the first doped region.
6. The Schottky diode device according to claim 4 , further comprising an isolation structure disposed in the substrate and at least surrounding the first well region from a top view perspective.
7. The Schottky diode device according to claim 4 , wherein the first conductive type is different from the second conductive type.
8. The Schottky diode device according to claim 4 , wherein the first well region defines an anode zone and a cathode zone, and each of the anode zone and the cathode zone overlaps the first doped region.
9. The Schottky diode device according to claim 8 , further comprising a second doped region disposed in the cathode zone and exposed from an upper surface of the substrate.
10. The Schottky diode device according to claim 8 , further comprising a third doped region on an upper surface of the substrate at a periphery of the anode zone and having the first conductive type.
11. The Schottky diode device according to claim 8 , wherein the first portion and the second portion extends through the anode zone and the cathode zone.
12. The Schottky diode device according to claim 4 , further comprising:
a gate layer on the substrate;
source/drain regions on two sides of the gate layer; and
a lightly doped region (LDD) in the substrate between the gate layer and the respective source/drain regions.
13. A semiconductor device, comprising:
a substrate;
a first well region and a second well region in the substrate; and
a first doped region and a second doped region in the first well region and the second well region, respectively, wherein the first well region comprises a first portion and a second portion alternating with each other, the second well region comprises a third portion and a fourth portion alternating with each other, and a first area ratio between the first portion and the second portion is different from a second area ratio between the third portion and the fourth portion.
14. The semiconductor device according to claim 13 , wherein the first portion and the second portion have different doping concentrations and the third portion and the fourth portion have different doping concentrations.
15. The semiconductor device according to claim 13 , wherein the first portion comprises a first plurality of strips having a first width, and the third portion comprises a second plurality of strips having a second width different from the first width.
16. The semiconductor device according to claim 15 , wherein the second portion comprises a third plurality of strips having a third width, and a ratio between the first width and the third width is from about 1:3 to about 3:1.
17. The semiconductor device according to claim 13 , wherein the alternatingly arranged first portion and second portion are formed as a plurality of concentric rectangular rings.
18. The semiconductor device according to claim 13 , further comprising an isolation structure extending in the substrate and defining the first well region and the second well region, wherein the first doped region has a depth less than the isolation structure.
19. The semiconductor device according to claim 18 , wherein each of the first well region and the second well region extends below the isolation structure.
20. The semiconductor device according to claim 13 , further comprising a metal-containing layer on the first doped region.