IP Library Granted Patent US 11,183,837
Granted Patent B2
US 11,183,837 · App. 16/223,352 · Granted Nov 23, 2021

Apparatuses and method for over-voltage event protection

Inventors: James Davis (Kuna, ID); Michael Chaine (Boise, ID)
Assignee: Micron Technology, Inc.
H02H9/041H01L27/0262H02H9/046
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Quick Facts
Patent No.
US 11,183,837
App. No.
16/223,352
Granted
Nov 23, 2021
Kind
B2
Abstract

Circuits, integrated circuits, apparatuses, and methods, such as those for protecting circuits against electrostatic discharge events are disclosed. An example apparatus comprises a thyristor coupled to a node and configured to limit the voltage and discharge the current associated with an over-voltage event at the node. The over-voltage event includes a negative voltage having a magnitude that exceeds a trigger voltage of the thyristor. The example apparatus further comprising a transistor coupled to the thyristor and configured to adjust the magnitude of the trigger voltage.

Claims (12)

1. A method comprising:

forming a first well doped with a first dopant type in a bulk material doped with a second dopant type;

forming a first region and a second region each doped with the second dopant type in the first well;

forming a second well doped with the second dopant type in the first well;

forming a third region in the second well doped with the first dopant type;

forming a gate on a surface of the substrate overlapping an area between the first region and the second region; and

connecting the first well and the first region to a common reference node.

2. The method of claim 1 , wherein forming a second well doped with the second dopant type in the first well includes forming the second well adjacent to the first region.

3. The method of claim 1 , further comprising connecting the second well to the second region.

4. The method of claim 1 , further comprising connecting the gate to a trigger voltage source.

5. The method of claim 1 , further comprising connecting the third region to a conductive pad.

6. The method of claim 1 , wherein the first region, the gate, the first well, and the second region together form a transistor, and wherein the first region, the first well, and the second region together form a lateral bi-polar junction transistor, wherein the third region, the second well, the first well, and the second region together form a thyristor.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 15, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 051026/0568 →
RELEASE OF SECURITY INTEREST Recorded Oct 14, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050718/0764 →
SUPPLEMENT NO. 11 TO PATENT SECURITY AGREEMENT Recorded Jan 16, 2019
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 048082/0860 →
SUPPLEMENT NO. 2 TO PATENT SECURITY AGREEMENT Recorded Jan 16, 2019
From: MICRON TECHNOLOGY, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 048082/0889 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 19, 2018
From: DAVIS, JAMES; CHAINE, MICHAEL
To: MICON TECHNOLOGY, INC.
Reel/Frame 047816/0753 →