IP Library › Granted Patent US 10,407,393
Granted Patent B2
US 10,407,393 · App. 16/229,805 · Granted Sep 10, 2019

High-purity quinoline derivative and method for manufacturing same

Inventors: Taiju Nakamura (Kamisu, JP); Taichi Abe (Kamisu, JP); Yusuke Miyashita (Kamisu, JP); Hirofumi Kuroda (Kamisu, JP); Yusuke Ayata (Kamisu, JP); Atsushi Akao (Kamisu, JP)
Assignee: Eisai R&D Management Co., Ltd.
C07D215/48A61K31/47
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Quick Facts
Patent No.
US 10,407,393
App. No.
16/229,805
Granted
Sep 10, 2019
Kind
B2
Abstract

Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.

Claims (3)

1. A methanesulfonate salt of a compound represented by formula (IV), wherein the content of a compound represented by formula (I) is 183 ppm by mass or less

2. The methanesulfonate salt of a compound represented by formula (IV) according to claim 1 , wherein the content of the methanesulfonate salt of a compound represented by formula (IV) is 98.0% by mass or more.

3. The methanesulfonate salt of a compound represented by formula (IV) according to claim 1 , wherein the content of the compound represented by formula (I) is determined by HPLC.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2019
From: NAKAMURA, TAIJU; ABE, TAICHI; MIYASHITA, YUSUKE; KURODA, HIROFUMI; AYATA, YUSUKE; AKAO, ATSUSHI
To: EISAI R&D MANAGEMENT CO., LTD.
Reel/Frame 048513/0649 →
Priority Claims (2)
JP 2014-174062 · Aug 28, 2014 · national
JP 2015-034729 · Feb 25, 2015 · national
Continuity (2)
Continuation 15503108
Related Publication 20190185432A1 · Jun 20, 2019
Cited By (4)
US 12,220,398 US 12,226,409 US 12,303,505 US 12,508,313