IP Library Granted Patent US 11,136,663
Granted Patent B2
US 11,136,663 · App. 16/229,943 · Granted Oct 5, 2021

Full-size mask assembly and manufacturing method thereof

Inventor: Jung Ho Kim (Hwaseong-si, KR)
Assignee: KPS CO., LTD.
C23C14/042G03F7/2063H01L51/0011
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Quick Facts
Patent No.
US 11,136,663
App. No.
16/229,943
Granted
Oct 5, 2021
Kind
B2
Abstract

Disclosed herein is a full-size mask assembly and a manufacturing method thereof. The full-size mask assembly according to an embodiment of the present invention includes a frame having a frame opening formed therein and a support surrounding the frame opening, a structural auxiliary mask supported by the support and having a plurality of shafts in a grid shape to form a plurality of structural auxiliary mask openings, and a plurality of cell unit masks supported by the structural auxiliary mask and each of which has a deposition pattern portion through which a deposition material passes.

Claims (20)

1. A manufacturing method of a full-size mask assembly provided by directing a cell unit mask to face a structural auxiliary mask opening formed in a structural auxiliary mask, the method comprising:

a structural auxiliary mask aligning operation of aligning the structural auxiliary mask with a frame opening formed at a frame to face the frame opening;

a structural auxiliary mask stretching operation of stretching the structural auxiliary mask in a first direction and a second direction;

a structural auxiliary mask fixing operation of fixing the structural auxiliary mask to the frame by forming a welding portion between the frame and the structural auxiliary mask;

a cell unit mask aligning operation of aligning the cell unit mask with the structural auxiliary mask opening of the structural auxiliary mask to face the structural auxiliary mask opening; and

a cell unit mask fixing operation of fixing the cell unit mask to the structural auxiliary mask by forming a cell unit coupler between the structural auxiliary mask and the cell unit mask,

wherein the cell unit mask aligning operation includes;

a cell unit mask stretching operation of applying, by a cell mask gripper, a tensile force to the cell unit mask in the first and second direction;

a cell unit mask first position alignment operation of aligning a first position alignment hole, which is located at a corner of one side of deposition pattern portion though which a deposition material passes, within the structural auxiliary mask opening in a vertical direction;

a cell unit mask second position alignment operation of aligning a plurality of second position alignment holes of the deposition pattern portion at a thin film transistor (TFT) position of a TFT glass in the vertical direction; and

a cell unit mask seating operation of seating the cell unit mask in the structural auxiliary mask opening.

2. The manufacturing method of claim 1 , wherein the cell unit mask second position alignment operation includes aligning a center of the plurality of second position alignment holes with the TFT position.

3. The manufacturing method of claim 1 , wherein the cell unit mask fixing operation includes welding the structural auxiliary mask to the cell unit mask using a laser beam located below the full-size mask assembly.

4. A manufacturing method of a full-size mask assembly, comprising:

a cell unit mask aligning operation of aligning each of cell unit masks to face a structural auxiliary mask opening formed at a structural auxiliary mask fixed to a frame,

wherein the cell unit mask aligning operation includes;

a cell unit mask stretching operation of applying, a cell mask gripper, a tensile force to the cell unit mask in first and second direction;

a cell unit mask first position alignment operation of aligning a first position alignment hole, which is located at a corner of one side of a deposition pattern portion through which a deposition material passes, within the structural auxiliary mask opening in a vertical direction;

a cell unit mask second position alignment operation of aligning a plurality of second position alignment holes of the deposition pattern portion at a thin film transistor (TFT) position of a TFT glass in the vertical direction; and

a cell unit mask seating operation of seating the cell unit mask in the structural auxiliary mask opening.

Assignments (2)
CHANGE OF NAME Recorded Jun 26, 2025
From: KPS CO., LTD.
To: KEEPS BIOPHARMA INC.
Reel/Frame 071756/0365 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 21, 2018
From: KIM, JUNG HO
To: KPS CO., LTD.
Reel/Frame 047843/0952 →
Priority Claims (1)
KR 10-2018-0064033 · Jun 4, 2018 · national
Continuity (1)
Related Publication 20190368025A1 · Dec 5, 2019