Methods and apparatus related to termination regions of a semiconductor device
In one general aspect, an apparatus can include a semiconductor region, and a trench defined within the semiconductor region. The trench can have a depth aligned along a vertical axis and have a length aligned along a longitudinal axis orthogonal to the vertical axis. The trench can have a first portion of the length included in a termination region of the semiconductor region and can have a second portion of the length included in an active region of the semiconductor region.
1. A method comprising:
forming a trench defined in a semiconductor region, the trench having a depth aligned along a vertical axis and having a length aligned along a longitudinal axis orthogonal to the vertical axis, the trench having a first portion of the length included in a termination region of the semiconductor region and having a second portion of the length included in an active region of the semiconductor region;
forming a shield electrode in the trench; and
forming a dielectric, the dielectric lining a bottom portion of the trench, the dielectric having a first portion disposed in the termination region of the semiconductor region and a second portion disposed in the active region of the semiconductor region, the first portion of the dielectric disposed in the termination region having a vertical thickness greater than a vertical thickness of the second portion of the dielectric disposed in the active region, the vertical thickness of the first portion of the dielectric extending between a bottom surface of the trench and a bottom surface of the shield electrode in the termination region, the vertical thickness of the second portion of the dielectric extending between the bottom surface of the trench and the bottom surface of the shield electrode in the active region.
2. The method of claim 1 , wherein the trench has a first width in the termination region aligned orthogonal to the vertical axis and aligned orthogonal to the longitudinal axis, the trench has a second width in the active region aligned orthogonal to the vertical axis and aligned orthogonal to the longitudinal axis, the first width of the trench is less than the second width of the trench.
3. The method of claim 1 , wherein the depth is a first depth in the active region, the trench has a second depth in the termination region that is shallower than the first depth.
4. The method of claim 1 , wherein the depth is a first depth in the active region, the trench has a second depth in the termination region that is shallower than the first depth, the trench has a third depth different than the first depth and different than the second depth.
5. The method of claim 1 , wherein the longitudinal axis is a first longitudinal axis, the trench is a first trench, the depth is a first depth in the active region, and the trench has a second depth in the termination region that is shallower than the first depth,
the method further comprising:
forming a second trench aligned along a second longitudinal axis orthogonal to the first longitudinal axis, the second trench intersecting the first trench, the second trench having a third depth, the third depth being different than the first depth and different than the second depth.
6. The method of claim 1 , wherein the trench is a first trench,
the method further comprising:
forming a second trench aligned parallel to the first trench; and
forming a third trench intersecting the first trench and intersecting the second trench such that the dielectric in the first trench is in contact with a dielectric disposed in the second trench and in contact with a dielectric disposed in the third trench.
7. The method of claim 1 , wherein the trench is a first trench,
the method further comprising:
forming a second trench aligned orthogonal to and intersecting the first trench, the first trench having a first width on a first side of the second trench that is greater than a second width on a second side of the second trench.
8. The method of claim 1 , further comprising:
forming an electrode in the first portion of the trench, the second portion of the trench excluding an electrode.
9. The method of claim 1 , wherein the first portion of the dielectric has a bottom surface at a depth that is deeper than a depth of a bottom surface of the second portion of the dielectric.
10. The method of claim 1 , wherein the trench is a first trench and the dielectric is a first dielectric,
the method further comprising:
forming a second trench aligned in a direction parallel to the first trench; and
forming a second dielectric, the second dielectric lining a bottom portion of the second trench lateral, in a direction perpendicular to the parallel direction, to the active region of the semiconductor region,
the second dielectric having a thickness substantially equal to the vertical thickness of the first portion of the first dielectric in the first trench.
11. A method, comprising:
forming a first trench in a semiconductor region, the first trench having a first portion included in a termination region of the semiconductor region and having a second portion included in an active region of the semiconductor region;
forming a dielectric, the dielectric lining a bottom portion of the first trench, the dielectric having a first portion disposed in the termination region of the semiconductor region and a second portion disposed in the active region of the semiconductor region, the first portion of the dielectric disposed in the termination region having a thickness different than a thickness of the second portion of the dielectric disposed in the active region; and
forming a second trench aligned parallel to the first trench and having a profile intersecting a profile of the first trench, the first trench having a depth different than a depth of the second trench, the first trench and the second trench defining a single trench.
12. The method of claim 11 , wherein the first trench is an active trench including a gate electrode and a shield electrode.
13. The method of claim 11 , wherein the first trench includes a shield electrode and excludes a gate electrode.
14. The method of claim 11 , wherein the second trench has a first portion aligned parallel to the first trench and the second trench has a second portion aligned perpendicular to the first trench,
the method further comprising:
forming a dopant well region having an edge separated from the second portion of the second trench.
15. The method of claim 11 , wherein the first trench includes a gate electrode and a shield electrode, the shield electrode having a recessed portion in the active region and a vertically extending portion in the termination region.
16. The method of claim 11 , wherein the second trench has a first portion aligned parallel to the first trench and the second trench has a second portion aligned perpendicular to the first trench,
the method further comprising:
forming a protrusion dielectric portion in contact with a dielectric disposed in the second portion of the second trench.
17. The method of claim 11 , wherein the second trench has a first portion aligned parallel to the first trench and the second trench has a second portion aligned perpendicular to the first trench,
the method further comprising:
forming a gate electrode having an edge intersecting a profile of the second portion of the second trench; and
forming a source electrode having an edge intersecting a profile of the second portion of the second trench.