Solution-phase inclusion of silver into chalcogenide semiconductor inks
Silver-containing absorbers for photovoltaic devices and techniques for fabrication thereof are provided. In one aspect, a method of forming an ink includes: mixing a silver halide and a solvent to form a first solution; mixing a metal, sulfur, and the solvent to form a second solution; combining the first solution and the second solution to form a precursor solution; and adding constituent components for an absorber material to the precursor solution to form the ink. Methods of forming an absorber film, a photovoltaic device, and the resulting photovoltaic device are also provided.
1. A photovoltaic device, comprising:
a substrate;
an electrically conductive layer on the substrate, wherein the electrically conductive layer comprises an alloy of molybdenum trioxide (MoO 3 ) and gold (Au);
an absorber layer on the electrically conductive layer, wherein the absorber layer comprises a silver halide, and wherein the silver halide is present throughout the absorber layer;
a buffer layer on the absorber layer;
a transparent front contact on the buffer layer; and
a metal grid on the transparent front contact.
2. The photovoltaic device of claim 1 , wherein the silver halide comprises a halide is selected from the group consisting of: chlorine (Cl), bromine (Br), and iodide (I).
3. The photovoltaic device of claim 1 , wherein the substrate is selected from the group consisting of: a glass substrate, a ceramic substrate, a metal foil substrate, and a plastic substrate.
4. The photovoltaic device of claim 1 , wherein the substrate is soda lime glass.
5. The photovoltaic device of claim 1 , wherein the electrically conductive layer has a thickness of from about 0.1 μm to about 2.5 μm, and ranges therebetween.
6. The photovoltaic device of claim 1 , wherein the buffer layer has a thickness of from about 100 angstroms (Å) to about 1,000 Å, and ranges therebetween.
7. The photovoltaic device of claim 1 , wherein the buffer layer comprises a material selected from the group consisting of: cadmium sulfide (CdS), a cadmium-zinc-sulfur material of the formula Cd 1−x Zn x S (wherein 0<x≤1), indium sulfide (In 2 S 3 ), zinc oxide, zinc oxysulfide, aluminum oxide (Al 2 O 3 ), and combinations thereof.
8. The photovoltaic device of claim 1 , wherein the transparent front contact comprises a material selected from the group consisting of: a transparent conductive oxide, indium-tin-oxide (ITO), aluminum (Al)-doped zinc oxide (ZnO) (AZO), and combinations thereof.
9. The photovoltaic device of claim 1 , wherein the metal grid comprises a material selected from the group consisting of: nickel (Ni), aluminum (Al), and combinations thereof.
10. A photovoltaic device, comprising:
a substrate;
an electrically conductive layer on the substrate, wherein the electrically conductive layer comprises an alloy of MoO 3 and Au;
an absorber layer on the electrically conductive layer, wherein the absorber layer comprises a kesterite absorber material containing copper (Cu), zinc (Zn), tin (Sn), and at least one of sulfur (S) and selenium (Se), wherein the absorber layer further comprises a silver halide, and wherein the silver halide is present throughout the absorber layer;
a buffer layer on the absorber layer;
a transparent front contact on the buffer layer; and
a metal grid on the transparent front contact.
11. The photovoltaic device of claim 10 , wherein the silver halide comprises a halide is selected from the group consisting of: Cl, Br, and I.
12. The photovoltaic device of claim 10 , wherein the substrate is selected from the group consisting of: a glass substrate, a ceramic substrate, a metal foil substrate, and a plastic substrate.
13. The photovoltaic device of claim 10 , wherein the electrically conductive layer has a thickness of from about 0.1 μm to about 2.5 μm, and ranges therebetween.
14. The photovoltaic device of claim 10 , wherein the buffer layer has a thickness of from about 100 Å to about 1,000 Å, and ranges therebetween.
15. The photovoltaic device of claim 10 , wherein the buffer layer comprises a material selected from the group consisting of: CdS, a cadmium-zinc-sulfur material of the formula Cd 1−X ,Zn x S (wherein 0<x≤1), In 2 S 3 , zinc oxide, zinc oxysulfide, Al 2 O 3 , and combinations thereof.
16. The photovoltaic device of claim 10 , wherein the transparent front contact comprises a material selected from the group consisting of: a transparent conductive oxide, ITO, Al-doped ZnO, and combinations thereof.
17. The photovoltaic device of claim 10 , wherein the metal grid comprises a material selected from the group consisting of: Ni, Al, and combinations thereof.