Composition, film forming method, method of manufacturing near infrared cut filter, method of manufacturing solid image pickup element, method of manufacturing image display device, and method of manufacturing infrared sensor
A composition includes: a near infrared absorbing compound A that includes a π-conjugated plane having a monocyclic or fused aromatic ring; and a solvent B, in which the solvent B includes a solvent B1 in which a solubility parameter is in a range between 19.9 MPa 0.5 or higher and 22.3 MPa 0.5 or lower and a solvent B2 in which a solubility parameter is lower than 19.9 MPa 0.5 or higher than 22.3 MPa 0.5 , and a content of the solvent B2 in the solvent B is 9 mass % or lower.
1. A composition comprising:
a near infrared absorbing compound A that includes a π-conjugated plane having a monocyclic or fused aromatic ring; and
a solvent B,
wherein the solvent B includes a solvent B1 in which a solubility parameter is in a range between 19.9 MPa 0.5 or higher and 22.3 MPa 0.5 or lower and a solvent B2 in which a solubility parameter is lower than 19.9 MPa 0.5 or higher than 22.3 MPa 0.5 , and
a content of the solvent B2 in the solvent B is 0.5 mass % or higher to 7.5 mass % or lower.
2. The composition according to claim 1 ,
wherein the solvent B1 is at least one selected from cyclohexanone, cyclopentanone, dipropylene glycol monomethyl ether, or 3-methoxybutanol.
3. The composition according to claim 1 ,
wherein the solvent B2 is at least one selected from propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, methylene chloride, ethyl-3-ethoxypropionate, N-methyl-2-pyrrolidone, butyl acetate, or ethyl lactate.
4. The composition according to claim 1 , further comprising:
a surfactant.
5. The composition according to claim 4 ,
wherein the surfactant is a compound having a fluorine atom and a curable group.
6. The composition according to claim 4 ,
wherein the surfactant is a compound having a fluoroether group and a curable group.
7. The composition according to claim 4 ,
wherein the surfactant is a polymer that includes a repeating unit having a fluoroether group and a repeating unit having a curable group.
8. The composition according to claim 4 ,
wherein a content of the surfactant is 0.1 to 12 mass % with respect to a total solid content of the composition.
9. The composition according to claim 1 , further comprising:
a resin.
10. The composition according to claim 1 , further comprising:
a polymerizable compound; and
a photopolymerization initiator.
11. A film forming method comprising:
applying the composition according to claim 1 to a support.
12. The film forming method according to claim 11 , further comprising:
forming a pattern.
13. A method of manufacturing a near infrared cut filter comprising:
the film forming method according to claim 11 .
14. A method of manufacturing a solid image pickup element comprising:
the film forming method according to claim 11 .
15. A method of manufacturing an image display device comprising:
the film forming method according to claim 11 .
16. A method of manufacturing an infrared sensor comprising:
the film forming method according to claim 11 .
17. The composition according to claim 1 ,
wherein the solvent B1: the solvent B2 is 91.5:8.5 to 99.5:0.5 in a mass ratio.
18. The composition according to claim 1 ,
wherein the solvent B1: the solvent B2 is 92.5:7.5 to 99.0:1.0 in a mass ratio.
19. The composition according to claim 1 ,
wherein the near infrared absorbing compound A is at least one selected from a pyrrolopyrrole compound, a cyanine compound, or a squarylium compound.
20. The composition according to claim 1 ,
wherein the near infrared absorbing compound A is a squarylium compound.
21. The composition according to claim 1 ,
wherein the solvent B2 includes propylene glycol monomethyl ether or ethyl-3-ethoxypropionate.
22. A composition comprising:
a near infrared absorbing compound A that includes a π-conjugated plane having a monocyclic or fused aromatic ring; and
a solvent B,
wherein the solvent B includes a solvent B1 in which a solubility parameter is in a range between 19.9 MPa 0.5 or higher and 22.3 MPa 0.5 or lower and a solvent B2 in which a solubility parameter is lower than 19.9 MPa 0.5 or higher than 22.3 MPa 0.5 ,
the solvent B1 includes cyclopentanone, and
a content of the solvent B2 is 9 mass % or lower.