Brewing vessel cleaning composition and related methods of use
An acidic cleaning composition and related methods of use for rapidly cleaning and sanitizing hard contact surfaces in the food and beverage industry. The acidic cleaning composition includes a concentrated acidic solution, a strong oxidizer, a surfactant, a suitable solvent and/or sufficient quantities of water. The acidic cleaning composition rapidly removes soils from food and beverage contact surfaces such as, for example, brewing vats and kegs, without requiring CO 2 be removed from the brewery vessel. The acidic cleaning composition can be in a concentrated form for dilution with additional dilution water at ambient or faucet temperature as opposed to requiring the use of “hot” water. The acidic cleaning composition is free-rinsing leaving essentially no residue on the contact surface. The surfactant provides low-foam properties so as to avoid cavitation and damage within a pump assembly.
1. An acidic cleaning composition for cleaning food and beverage contact surfaces, comprising:
an acidic solution comprising about 8% to about 75% by volume of the acidic cleaning composition, the acidic solution comprising a combination of at least one inorganic acid in an amount of about 5% to about 72% by volume of the acidic solution, at least one organic acid in an amount of about 0.5% to about 45% by volume of the acidic solution, and at least one chelant component in an amount of about 0.5% to about 30% by volume of the acidic cleaning composition, the at least one chelant component chosen from etidronic (HEDP) acid (1-Hydroxyethylidene-1,1-diphosphonic acid), ATMPT (Aminotris(methylenephosphonic acid), EDTMP (Ethylenediaminetetra(methylenephosphonic acid), TDTMP (Tetramethylenediaminetetra(methylenephosphonic acid), HDTMP (Hexamethylenediaminetetra(methylenephosphonic acid), DTPMP (Diethylenetriaminepenta(methylenephosphonic acid), 2-phosphonobutane 1,2,4-tricarboxylic acid, Nitrilotrimethylenetris(diphosphonic acid), and mixtures thereof;
at least one surfactant in an amount of about 1% to about 30% by volume of the acidic cleaning composition;
an oxidizing agent comprising hydrogen peroxide present in an amount from about 1% to about 25% by volume of the acidic cleaning composition;
optionally a solvent present in an amount from about 1% to about 8% by volume of the acidic cleaning composition; and
water in an amount sufficient to achieve the desired concentration of the acidic solution, at least one surfactant, oxidizing agent, and optional solvent.
2. The acidic cleaning composition of claim 1 , wherein the acid solution comprises phosphoric acid in an amount of about 5% to about 72% by volume of the acidic solution, hydroxyacetic acid in an amount of about 0.5% to about 45% by volume of the acidic solution, and etidronic (HEDP) acid in an amount of about 0.5% to about 3% by volume of the acidic solution.
3. The acidic cleaning composition of claim 1 , wherein the acid solution comprises phosphoric acid in an amount of about 5% to about 72% by volume of the acidic solution.
4. The acidic cleaning composition of claim 1 , wherein the acid solution comprises hydroxyacetic acid in an amount of about 0.5% to about 45% by volume of the acidic solution.
5. The acidic cleaning composition of claim 1 , wherein the acid solution comprises etidronic (HEDP) acid in an amount of about 0.5% to about 3% by volume of the acidic solution.
6. The acidic cleaning composition of claim 1 , wherein the acidic solution further comprises sulfuric acid.
7. The acidic cleaning composition of claim 1 , wherein the chelant component is in an amount from about 0.5% to about 3% by volume of the acidic cleaning composition.
8. The acidic cleaning composition of claim 1 , wherein the at least one surfactant comprises a sultaine surfactant in an amount from about 0.5% to about 5% of by volume of the acidic cleaning composition.
9. The acidic cleaning composition of claim 8 , wherein the sultaine surfactant comprises alkyl ether hydroxypropyl sultaine or cocamidopropyl hydroxysultaine.
10. The acidic cleaning composition of claim 1 , wherein the at least one surfactant comprises an amine oxide in an amount from about 0.5% to about 5% of by volume of the acidic cleaning composition.
11. The acidic cleaning composition of claim 10 , wherein the amine oxide surfactant comprises octyl dimethylamine oxide, decyl dimethylamine oxide, lauryl dimethylamine oxide, dihydroxyethyl cocamine oxide, myristyl dimethylamine oxide, cetyl dimethylamine oxide or oleyl dimethylamine oxide.
12. The acidic cleaning composition of claim 1 , wherein the oxidizing agent comprises hydrogen peroxide in an amount from about 2% to about 15% by volume of the acidic cleaning composition.
13. The acidic cleaning composition of claim 1 , wherein the solvent is glycol ether.
14. An acidic cleaning solution comprising the acidic cleaning composition of claim 1 and dilution water, wherein the acidic cleaning composition is mixed with the dilution water at a ratio of 1 to 32 fluid ounces of acidic cleaning composition per US gallon of dilution water.
15. A method for cleaning a food and beverage contact surface, comprising:
introducing the acidic cleaning solution of claim 14 to a food and beverage contact surface.
16. The method of claim 15 , wherein the food and beverage contact surface comprises an interior surface of a brewery vessel.
17. The method of claim 16 , wherein the brewery vessel contains elevated levels of CO 2 .
18. The method of claim 15 , wherein the dilution water is at ambient temperature.
19. The method of claim 15 , further comprising rinsing the food and beverage contact surface with rinse water to remove residue from the food and beverage contact surfaces.
20. A method for cleaning a food and beverage contact surface, the method comprising:
introducing an acid cleaning solution to a food and beverage contact surface, the acid cleaning solution including an acidic cleaning composition comprising: an acidic solution comprising about 8% to about 75% by volume of the acidic cleaning composition, the acidic solution comprising a combination of at least three mineral and organic acids including phosphoric acid in an amount of about 5% to about 72% by volume of the acidic solution, hydroxyacetic acid in an amount of about 0.5% to about 45% by volume of the acidic solution, etidronic (HEDP) acid in an amount of about 0.5% to about 30% by volume of the acidic solution, and optionally sulfuric acid;
a surfactant comprising a sultaine surfactant and an amine oxide surfactant in an amount of about 1% to about 30% by volume of the acidic cleaning composition, the sultaine surfactant comprising about 0.5% to about 15% by volume of the acidic cleaning composition, and the amine oxide surfactant comprising about 0.5% to about 15% by volume of the acidic cleaning composition;
an oxidizing agent comprising hydrogen peroxide present in an amount from about 1% to about 25% by volume of the acidic cleaning composition;
optionally a solvent present in an amount from about 1% to about 8% by volume of the acidic cleaning composition; and
water in an amount sufficient to achieve the desired concentration of the acidic solution, at least one surfactant, oxidizing agent, and optional solvent; and
rinsing the food and beverage contact surface with rinse water to remove residue from the food and beverage contact surfaces.
21. An acidic cleaning composition for cleaning food and beverage contact surfaces, comprising:
an acidic solution comprising about 30% to about 75% by volume of the acidic cleaning composition, the acidic solution comprising at least one inorganic acid in an amount of about 5% to about 72% by volume of the acidic solution, the at least one inorganic acid chosen from phosphoric acid, sulfuric acid, or a combination thereof, at least one organic acid in an amount of about 0.5% to about 45% by volume of the acidic solution, and at least one chelant component in an amount of about 0.5% to about 30% by volume of the acidic cleaning composition, the at least one chelant component chosen from etidronic (HEDP) acid (1-Hydroxyethylidene-1,1-diphosphonic acid), ATMPT (Aminotris(methylenephosphonic acid), EDTMP (Ethylenediaminetetra(methylenephosphonic acid), TDTMP (Tetramethylenediaminetetra(methylenephosphonic acid), HDTMP (Hexamethylenediaminetetra(methylenephosphonic acid), DTPMP (Diethylenetriaminepenta(methylenephosphonic acid), 2-phosphonobutane 1,2,4-tricarboxylic acid, Nitrilotrimethylenetris(diphosphonic acid), and mixtures thereof;
at least one surfactant in an amount of about 1% to about 30% by volume of the acidic cleaning composition;
an oxidizing agent comprising hydrogen peroxide present in an amount from about 1% to about 25% by volume of the acidic cleaning composition;
optionally a solvent present in an amount from about 1% to about 8% by volume of the acidic cleaning composition; and
water in an amount sufficient to achieve the desired concentration of the acidic solution, at least one surfactant, oxidizing agent, and optional solvent.
22. The acidic cleaning composition of claim 21 , wherein the at least one chelant component acid solution comprises etidronic (HEDP) acid in an amount of about 0.5% to about 3% by volume of the acidic solution.
23. The acidic cleaning composition of claim 22 , wherein the at least one inorganic acid is phosphoric acid and sulfuric acid in an amount of about 20% to about 35% by volume of the acidic solution.
24. The acidic cleaning composition of claim 23 , wherein the at least one organic acid in an amount of about 0.5% to about 3% by volume of the acidic solution.
25. An acidic cleaning composition for cleaning food and beverage contact surfaces, comprising:
an acidic solution comprising about 30% to about 75% by volume of the acidic cleaning composition, the acidic solution comprising at least one inorganic acid in an amount of about 5% to about 72% by volume of the acidic solution, at least one organic acid in an amount of about 0.5% to about 45% by volume of the acidic solution, the at least one organic acid being a carboxylic acid, sulfonic acid or phosphonic acid, and at least one chelant component in an amount of about 0.5% to about 30% by volume of the acidic cleaning composition, the at least one chelant component chosen from etidronic (HEDP) acid (1-Hydroxyethylidene-1,1-diphosphonic acid), ATMPT (Aminotris(methylenephosphonic acid), ED TMP (Ethylene diaminetetra(methylenephosphonic acid), TDTMP (Tetramethylenediaminetetra(methylenephosphonic acid), HD TMP (Hexamethylenediaminetetra(methylenephosphonic acid), DTPMP (Diethylenetriaminepenta(methylenephosphonic acid), 2-phosphonobutane 1,2,4-tricarboxylic acid, Nitrilotrimethylenetris(diphosphonic acid), and mixtures thereof;
at least one surfactant in an amount of about 1% to about 30% by volume of the acidic cleaning composition;
an oxidizing agent comprising hydrogen peroxide present in an amount from about 1% to about 25% by volume of the acidic cleaning composition;
optionally a solvent present in an amount from about 1% to about 8% by volume of the acidic cleaning composition; and
water in an amount sufficient to achieve the desired concentration of the acidic solution, at least one surfactant, oxidizing agent, and optional solvent.
26. The acidic cleaning composition of claim 25 , wherein the at least one organic acid in an amount of about 0.5% to about 3% by volume of the acidic solution.
27. The acidic cleaning composition of claim 26 , wherein the at least one chelant component acid solution comprises etidronic (HEDP) acid in an amount of about 0.5% to about 3% by volume of the acidic solution.