Charged particle beam apparatus comprising a controller to set control parameters based on movement of the sample stage
Provided is a charged particle beam apparatus including: an XY stage on which a sample is placed; a charged particle beam source which irradiates the sample with a charged particle beam; a detector which detects charged particles emitted from the sample upon the irradiation with the charged particle beam; an image generator which generates an SEM image of the sample based on a detection signal output by the detector; and a controller configured to set control parameters based on a movement starting point and a movement ending point of the XY stage and control a driving unit for moving the XY stage according to the control parameters.
1. A charged particle beam apparatus comprising:
an XY stage on which a sample is placed;
a charged particle beam source which irradiates the sample with a charged particle beam;
a detector which detects charged particles emitted from the sample upon the irradiation with the charged particle beam;
an image generator which generates an SEM image of the sample based on a detection signal output by the detector; and
a controller configured to set control parameters based on a movement starting point and a movement ending point of the XY stage and control a driving unit for moving the XY stage according to the control parameters.
2. The charged particle beam apparatus according to claim 1 , wherein
the controller includes a storage unit which stores a parameter map in which the control parameters are stored for each combination of a movement starting point and a movement ending point, and
the control parameters are set based on the given movement starting point and movement ending point and the parameter map.
3. The charged particle beam apparatus according to claim 2 , wherein
the parameter map is created based on a result of a frequency analysis on an SEM image acquired after moving the XY stage.
4. The charged particle beam apparatus according to claim 2 , wherein
the parameter map is created based on a result of frequency analyses on a reference image, which is an SEM image when the XY stage is in a steady state, and on an SEM image acquired after moving the XY stage.
5. The charged particle beam apparatus according to claim 2 , wherein
the parameter map is updated when amplitude of vibrations included in the SEM image becomes equal to or greater than a predetermined threshold value due to a change of a guiding mechanism or the driving unit of the XY stage.
6. The charged particle beam apparatus according to claim 5 , wherein
SEM images before and after the update of the parameter map are displayed.
7. The charged particle beam apparatus according to claim 2 , wherein
the parameter map is created for each Z coordinate of the XY stage.
8. The charged particle beam apparatus according to claim 2 , wherein
the parameter map is created for each tilt angle of the XY stage.
9. The charged particle beam apparatus according to claim 1 , wherein
the controller includes a filter processor performing filtering processing to exclude specific vibration frequency components.
10. The charged particle beam apparatus according to claim 9 , wherein
the filter processor performs the filtering processing with a notch filter.
11. The charged particle beam apparatus according to claim 9 , wherein
the vibration frequency component excluded by the filter processor is specified based on a result of a frequency analysis on an SEM image acquired after moving the XY stage.
12. The charged particle beam apparatus according to claim 11 , wherein
the vibration frequency component excluded by the filter processor is a frequency having amplitude equal to or greater than a predetermined threshold value in the result of the frequency analysis.
13. The charged particle beam apparatus according to claim 11 , wherein
the vibration frequency component excluded by the filter processor is a frequency at which an attenuation coefficient of amplitude obtained based on a result of a frequency analysis on each SEM image acquired at different time points after moving the XY stage is equal to or greater than a predetermined threshold value.