Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same
Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
1. A sputtering target comprising:
an alloy of formula (CoFe) 1-x B x , wherein 0.2≤x≤0.4;
wherein the sputtering target has a column microstructure framed by borides and a magnetic pass through flux of at least 30% at a thickness of 3 mm; and
wherein the sputtering target is substantially free of cracks.
2. The sputtering target of claim 1 , wherein the sputtering target has a purity of greater than 99.99%.
3. The sputtering target of claim 1 , wherein the sputtering target has an oxygen content less than 40 ppm.
4. The sputtering target of claim 1 , wherein the sputtering target has a diameter of up to 250 mm.
5. The sputtering target of claim 1 , wherein the alloy further comprises C or Al.
6. A sputtering target having a column microstructure framed by CoFeB intermetallics, wherein the sputtering target comprises an alloy of formula (CoFe) 1-x B x , wherein 0.2≤x≤0.4, and wherein the sputtering target has a purity of greater than 99.99% and a low oxygen content of 40 ppm or less.
7. The sputtering target of claim 6 , wherein the sputtering target has a pass through flux of at least 30% at a thickness of 3 mm.
8. The sputtering target of claim 6 , wherein the sputtering target has a diameter of up to 250 mm.
9. The sputtering target of claim 6 , wherein the alloy further comprises C or Al.