IP Library › Granted Patent US 10,727,398
Granted Patent B1
US 10,727,398 · App. 16/262,437 · Granted Jul 28, 2020

MTJ containing device containing a bottom electrode embedded in diamond-like carbon

Inventors: Nathan P. Marchack (New York, NY); Bruce B. Doris (Slingerlands, NY); Chandrasekharan Kothandaraman (New York, NY)
Assignee: International Business Machines Corporation
H01L43/02H01L43/12
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Quick Facts
Patent No.
US 10,727,398
App. No.
16/262,437
Granted
Jul 28, 2020
Kind
B1
Abstract

A magnetic tunnel junction (MTJ) containing device is provided in which a bottom electrode having a small CD is formed and is located laterally adjacent to diamond like carbon (DLC). DLC replaces a material stack of, from bottom to top, a silicon nitride layer and an organic planarization layer (OPL) which is typically used in providing a conductive structure having a reduced CD. DLC provides a higher etch resistance to IBE than silicon nitride, but DLC can be patterned using conventional etchants. The use of DLC thus reduces the number of processing steps for providing a reduced CD bottom electrode, and also provides a more robust solution to the issue of punch through to an underlying conductive material layer.

Claims (12)

1. A magnetic tunnel junction (MTJ) containing device comprising:

a MTJ pillar located on a topmost surface of a bottom electrode, wherein a diamond like carbon (DLC) layer is located laterally adjacent to the bottom electrode; and

a top electrode located on the MTJ pillar.

2. The MTJ containing device of claim 1 , wherein the bottom electrode is located on a topmost surface of an electrically conductive structure that is embedded in an interconnect dielectric material layer.

3. The MTJ containing device of claim 2 , wherein the DLC layer is present on the entirety of the topmost surface of the interconnect dielectric material layer, and wherein a portion of the DLC layer extends onto the topmost surface of the electrically conductive structure.

4. The MTJ containing device of claim 1 , wherein the bottom electrode has a critical dimension from 20 nm to 60 nm.

5. The MTJ containing device of claim 1 , wherein the MTJ pillar comprises a magnetic reference material, a tunnel barrier material, and a magnetic free material, wherein the magnetic reference material forms an interface with the bottom electrode.

6. The MTJ containing device of claim 1 , wherein no resputtered conductive metal particles are present on a sidewall of the MTJ pillar.

7. The MTJ containing device of claim 1 , wherein the bottom electrode has a smaller critical dimension than a critical dimension of the MTJ pillar and the top electrode.

8. The MTJ containing device of claim 7 , wherein a portion of the MTJ pillar directly contacts a topmost surface of the DLC layer.

9. The MTJ containing device of claim 1 , wherein the DLC layer has a recessed region located at a footprint of the MTJ pillar.

10. The MTJ containing device of claim 9 , wherein the recessed region of the DLC layer has a concave surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2019
From: MARCHACK, NATHAN P.; DORIS, BRUCE B.; KOTHANDARAMAN, CHANDRASEKHARAN
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 048193/0360 →
Cited By (2)
US 12,557,555 US 12,666,880