Apparatus and method for producing alkaline water for cleaning electronic device
To provide method and apparatus for producing alkaline water, capable of preventing mixture of fine particles derived from a gas dissolving membrane device into hydrogen water. An apparatus for producing alkaline water for cleaning electronic device includes: a pH adjusting device 11 configured to adjust ultrapure water to be alkaline; a deaeration device 13 configured to deaerate the ultrapure water adjusted to be alkaline; and a gas dissolving membrane device 14 having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
1. An apparatus for producing alkaline water for cleaning electronic device, the apparatus comprising:
a pH adjusting device to add a pH regulator into ultrapure water to keep the ultrapure water alkaline;
a feed water pump to feed the ultrapure water kept alkaline at a discharge pressure 0.2 MPa to 0.4 MPa;
a deaerator to deaerate the ultrapure water fed from the feed water pump; and
a gas dissolver having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
2. The apparatus for producing alkaline water for cleaning electronic device according to claim 1 , wherein the pH adjusting device adjusts pH of the ultrapure water at 8 to 11.
3. The apparatus for producing alkaline water for cleaning electronic device according to claim 1 , wherein the pH adjusting device adds, to the ultrapure water, at least one alkaline component selected from the group consisting of ammonia, sodium tetramethylammonium hydroxide, 2-hydroxyethyl trimethylammonium hydroxide (choline), sodium hydroxide, and potassium hydroxide.
4. The apparatus for producing alkaline water for cleaning electronic device according to claim 3 , wherein the alkaline component is ammonia.
5. The apparatus for producing alkaline water for cleaning electronic device according to claim 3 , wherein the pH adjusting device adds, to the ultrapure water, the alkaline component in an amount that a concentration thereof in the alkaline water becomes 2 mg/L to 100 mg/L.
6. The apparatus for producing alkaline water for cleaning electronic device according to claim 1 , wherein the functional gas is at least one selected from the group consisting of hydrogen gas, ozone gas, and noble gas.
7. The apparatus for producing alkaline water for cleaning electronic device according to claim 6 , wherein the functional gas is hydrogen gas.
8. The apparatus for producing alkaline water for cleaning electronic device according to claim 7 , wherein a hydrogen gas concentration in the alkaline water is 1.0 mg/L to 1.6 mg/L.
9. The apparatus for producing alkaline water for cleaning electronic device according to claim 1 , wherein the gas permeable membrane comprises at least one material selected from the group consisting of polypropylene and polyvinylidene fluoride.
10. A method for producing alkaline water for cleaning electronic device, the method comprising:
adjusting a pH of ultrapure water to keep the ultrapure water alkaline;
feeding the alkaline ultrapure water at a discharge pressure 0.2 MPa to 0.4 MPa by a feed water pump;
deaerating the alkaline ultrapure water fed by the feed water pump; and
dissolving functional gas into the deaerated alkaline ultrapure water.