Three-dimensional mask model for photolithography simulation
A three-dimensional mask model that provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.
1. A method comprising:
obtaining a plurality of kernels for adapting a mask design layout for a physical optical mask for creating a device pattern, to a mask 3D transmission;
applying a filter in relation to the plurality of kernels and the mask design layout; and
using, by a hardware computer system, results of the filtering and the plurality of kernels with a thin mask transmission corresponding to the mask design layout to create a mask 3D transmission corresponding to the mask design layout, wherein the mask 3D transmission, or information derived therefrom, is configured to guide manufacture of the physical optical mask for creating the device pattern.
2. The method of claim 1 , wherein the kernels are independent of the layout of any particular mask.
3. The method of claim 1 , wherein the filtering comprises limiting frequencies.
4. The method of claim 1 , further comprising applying, by the hardware computer system, a thin mask model to the mask design layout to create the thin mask transmission.
5. The method of claim 1 , further comprising applying, by the hardware computer system, at least an optical model to the mask 3D transmission, or information derived therefrom, to create an image corresponding to the mask design layout.
6. The method of claim 1 , wherein the kernels are for transverse electric (TE) polarization and transverse magnetic (TM) polarization.
7. The method of claim 1 , wherein obtaining the plurality of kernels further comprises:
receiving a mask topography structure;
performing a rigorous simulation to simulate a near-field in relation to the mask topography structure; and
deriving the plurality of kernels from the near-field.
8. The method of claim 1 , wherein the mask 3D transmission is in a spatial domain form.
9. A non-transitory computer-readable medium having instructions stored thereon which, when executed by a computer system, are configured to cause the computer system to at least:
obtain a plurality of kernels for adapting a mask design layout for a physical optical mask for creating a device pattern, to a mask 3D transmission;
apply a filter in relation to the plurality of kernels and the mask design layout; and
use results of the filtering and the plurality of kernels with a thin mask transmission corresponding to the mask design layout to create a mask 3D transmission corresponding to the mask design layout, wherein the mask 3D transmission, or information derived therefrom, is configured to guide manufacture of the physical optical mask for creating the device pattern.
10. The computer-readable medium of claim 9 , wherein the kernels are independent of the layout of any particular mask.
11. The computer-readable medium of claim 9 , wherein the instructions configured to apply the filter are configured to limit frequencies.
12. The computer-readable medium of claim 9 , wherein the instructions are further configured to apply a thin mask model to the mask design layout to create the thin mask transmission.
13. The computer-readable medium of claim 9 , wherein the instructions are further configured to apply at least an optical model to the mask 3D transmission, or information derived therefrom, to create an image corresponding to the mask design layout.
14. The computer-readable medium of claim 9 , wherein the kernels are for transverse electric (TE) polarization and transverse magnetic (TM) polarization.
15. The computer-readable medium of claim 9 , wherein the instructions configured to obtain the plurality of kernels are further configured to:
receive a mask topography structure;
perform a rigorous simulation to simulate a near-field in relation to the mask topography structure; and
derive the plurality of kernels from the near-field.
16. A non-transitory computer-readable medium having instructions stored thereon which, when executed by a computer system, are configured to cause the computer system to at least:
apply a filtering as part of generating a plurality of kernels for adapting a mask design layout for a physical optical mask for creating a device pattern, to a mask 3D transmission; and
apply the plurality of kernels with the mask design layout to create a mask 3D transmission corresponding to the mask design layout, wherein the mask 3D transmission, or information derived therefrom, is configured to guide manufacture of the physical optical mask for creating the device pattern.
17. The computer-readable medium of claim 16 , wherein the instructions configured to apply the filtering are configured to limit frequencies.
18. The computer-readable medium of claim 16 , wherein the kernels are independent of the layout of any particular mask.
19. The computer-readable medium of claim 16 , wherein the kernels are for transverse electric (TE) polarization and transverse magnetic (TM) polarization.
20. The computer-readable medium of claim 16 , wherein the instructions are further configured to:
receive a mask topography structure;
perform a rigorous simulation to simulate a near-field in relation to the mask topography structure; and
derive the plurality of kernels from the near-field.
21. The computer-readable medium of claim 16 , wherein the instructions are further configured to apply a thin mask model to the mask design layout to create a thin mask transmission for use in application of the plurality of kernels with the mask design layout to create a mask 3D transmission.