Reduction of crystal growth resulting from annealing a conductive material
Systems, apparatuses, and methods related to reduction of crystal growth resulting from annealing a conductive material are described. An example apparatus includes a conductive material selected to have an electrical resistance that is reduced as a result of annealing. A stabilizing material may be formed over a surface of the conductive material. The stabilizing material may be selected to have properties that include stabilization of the reduced electrical resistance of the conductive material and reduction of a degree of freedom of crystal growth relative to the surface resulting from recrystallization of the conductive material during the annealing.
1. An apparatus, comprising:
a substrate material that is a nitride of one or more refractory metals;
an annealed conductive material formed over a surface of the substrate material, and selected to have an electrical resistance that is reduced as a result of annealing, wherein the annealed conductive material comprises a noble metal and wherein the noble metal is deposited to a thickness of around 2 to 50 nanometers on the substrate material; and
a stabilizing material formed over a surface of a conductive material prior to annealing the conductive material, wherein the stabilizing material is formed as a thin film on the surface to a thickness of one (1.0) nanometer or less and wherein the stabilizing material is a nitride of one or more refractory metals and is selected to have properties that comprise:
stabilization of the reduced electrical resistance of the conductive material; and
reduction of a degree of freedom of crystal growth relative to the surface resulting from recrystallization of the conductive material during the annealing.
2. The apparatus of claim 1 , wherein a property of the selected stabilizing material reduces a scattering of electrons to contribute to the stabilization of the reduced electrical resistance.
3. The apparatus of claim 1 , wherein a property of the selected stabilizing material reduces production of phonons to contribute to the stabilization of the reduced electrical resistance.
4. The apparatus of claim 1 , wherein the annealed conductive material is formed to a thickness in a range of from two (2.0) to fifty (50) nanometers.
5. The apparatus of claim 1 , wherein the annealed conductive material is utilized as at least one of an access line, a sense line, and an electrode for a semiconductor memory device.