Designs and methods for conductive bumps
Methods, techniques, and structures relating to die packaging. In one exemplary implementation, a die package interconnect structure includes a semiconductor substrate and a first conducting layer in contact with the semiconductor substrate. The first conducting layer may include a base layer metal. The base layer metal may include Cu. The exemplary implementation may also include a diffusion barrier in contact with the first conducting layer and a wetting layer on top of the diffusion barrier. A bump layer may reside on top of the wetting layer, in which the bump layer may include Sn, and Sn may be electroplated. The diffusion barrier may be electroless and may be adapted to prevent Cu and Sn from diffusing through the diffusion barrier. Furthermore, the diffusion barrier may be further adapted to suppress a whisker-type formation in the bump layer.
1. An assembly comprising:
a die;
a pad disposed on the die, the pad including aluminum;
a base layer metal on the pad, the base layer metal including an adhesion layer directly on the pad, a layer of aluminum directly on the adhesion layer, and a seed layer directly on the layer of aluminum, wherein the adhesion layer comprises titanium, and wherein the seed layer comprises nickel or cobalt;
a diffusion barrier layer directly on the base layer metal, the diffusion barrier layer including nickel, wherein the diffusion barrier layer has a non-planar top surface;
a copper bump above and directly on and in direct contact with the non-planar top surface of the diffusion barrier layer, wherein an entirety of the copper bump has a planar top surface; and
a solder layer above and directly on the planar top surface of the copper bump, the solder layer comprising tin, silver and copper.
2. The assembly of claim 1 , further comprising a package, the package comprising a package layer coupled to the solder layer.
3. The assembly of claim 1 , wherein the die is a silicon die.
4. The assembly of claim 1 , wherein the diffusion barrier further includes phosphorous.
5. The assembly of claim 1 , wherein the diffusion barrier further includes boron.
6. The assembly of claim 1 , wherein the solder layer further includes bismuth.
7. The assembly of claim 1 , wherein the solder layer further includes antimony.
8. The assembly of claim 1 , wherein the assembly is substantially free of lead.