IP Library › Granted Patent US 11,194,078
Granted Patent B2
US 11,194,078 · App. 16/288,768 · Granted Dec 7, 2021

Antireflection film having silver-containing layer and fluorocarbon layer, method for producing antireflection film, optical element, and optical system

Inventors: Seigo Nakamura (Kanagawa, JP); Kenichi Umeda (Kanagawa, JP); Yuichiro Itai (Kanagawa, JP); Shinichiro Sonoda (Kanagawa, JP)
Assignee: FUJIFILM Corporation
G02B1/111B32B7/02B32B9/00B32B15/04B32B27/00G02B1/113G02B1/18G02B15/145
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Quick Facts
Patent No.
US 11,194,078
App. No.
16/288,768
Granted
Dec 7, 2021
Kind
B2
Abstract

Provided is an antireflection film that is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, in this order, on a substrate, in which the interlayer is a multilayer film having two or more layers, in which a layer of high refractive index having a relatively high refractive index and a layer of low refractive index having a relatively low refractive index are alternately laminated, and the dielectric layer has a surface to be exposed to air and is a multilayer film having two or more layers including an oxide layer and a fluorocarbon layer which is a self-assembled film that is formed by a silane coupling reaction to the oxide layer in this order.

Claims (29)

1. An antireflection film that is provided on a substrate and is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, in this order, on the substrate,

wherein the interlayer is a multilayer film having two or more layers, in which a layer of high refractive index having a relatively high refractive index and a layer of low refractive index having a relatively low refractive index are alternately laminated,

wherein the dielectric layer has a surface to be exposed to air and is a multilayer film having two or more layers including an oxide layer and a fluorocarbon layer, which is a self-assembled film that is formed by a silane coupling reaction to the oxide layer,

wherein the dielectric layer includes a silicon oxide layer, and a layer having a refractive index lower than a refractive index of the silicon oxide layer, and

wherein the layer having a refractive index lower than a refractive index of the silicon oxide layer is provided nearer to the silver-containing metal layer than the oxide layer.

2. The antireflection film according to claim 1 ,

wherein the oxide layer is the silicon oxide layer.

3. The antireflection film according to claim 1 ,

wherein the layer having a refractive index lower than the refractive index of the silicon oxide layer is a magnesium fluoride layer.

4. The antireflection film according to claim 3 ,

wherein the magnesium fluoride layer is arranged closer to the silver-containing metal layer than the silicon oxide layer.

5. The antireflection film according to claim 1 ,

wherein the surface to be exposed to air of the dielectric layer is formed of a fluorocarbon layer.

6. The antireflection film according to claim 1 ,

wherein a thickness of the fluorocarbon layer is 20 nm or less.

7. The antireflection film according to claim 1 ,

wherein a thickness of the silver-containing metal layer is 6 nm or less.

8. The antireflection film according to claim 1 , further comprising:

an anchor layer provided between the silver-containing metal layer and the interlayer.

9. The antireflection film according to claim 1 , further comprising:

an anchor region including an oxide of an anchor metal provided between the silver-containing metal layer and the interlayer; and

a cap region including an oxide of the anchor metal provided between the silver-containing metal layer and the dielectric layer.

10. A method for producing the antireflection film according to claim 1 , the method comprising:

sequentially laminating the interlayer and the silver-containing metal layer on one surface of the substrate by a vapor phase growth method; and

laminating the oxide layer on the silver-containing metal layer by a vapor phase growth method, and then immersing at least a surface of the oxide layer in a solution including a silane coupling agent having a fluorocarbon group to form the fluorocarbon layer by self-organization through a silane coupling reaction to the surface of the oxide layer.

11. An optical element comprising:

the antireflection film according to claim 1 .

12. An optical system comprising:

a group lens, which includes the optical element according to claim 11 , and in which a surface of the optical element having the antireflection film provided thereon is arranged on outermost surfaces.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2019
From: NAKAMURA, SEIGO; UMEDA, KENICHI; ITAI, YUICHIRO; SONODA, SHINICHIRO
To: FUJIFILM CORPORATION
Reel/Frame 048483/0954 →
Priority Claims (1)
JP JP2016-177505 · Sep 12, 2016 · national
Continuity (2)
Continuation PCTJP2017032118 · Sep 6, 2017
Related Publication 20190196064A1 · Jun 27, 2019