IP Library Granted Patent US 11,056,794
Granted Patent B2
US 11,056,794 · App. 16/299,726 · Granted Jul 6, 2021

Dual-polarized antenna

Inventors: Koh Hashimoto (Yokohama Kanagawa, JP); Makoto Higaki (Setagaya Tokyo, JP); Manabu Mukai (Yokohama Kanagawa, JP)
Assignee: KABUSHIKI KAISHA TOSHIBA
H01Q9/0457H01Q1/48H01Q9/0435
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Quick Facts
Patent No.
US 11,056,794
App. No.
16/299,726
Granted
Jul 6, 2021
Kind
B2
Abstract

A method for producing a dual-polarized antenna includes providing first, second and third dielectric substrates with first and second main surfaces. The method includes patterning a conductive film on the first main surface of the first dielectric substrate to form a first ground conductor having an opening and a metal patch as a radiation element, the patch aligned to the opening in a lamination direction, patterning a conductive film on the first main surface of the second dielectric substrate to form a first feed probe configured to excite the metal patch, patterning a conductive film on the second main surface of the second dielectric substrate to form a second ground conductor having a slot generally parallel to the first feed probe, and patterning a conductive film on the second main surface of the third dielectric substrate to form a second feed probe generally perpendicular to the slot.

Claims (40)

1. A method for producing a dual-polarized antenna, the method comprising:

providing a first dielectric substrate having a first main surface and a second main surface opposite to the first main surface;

patterning a conductive film provided on the first main surface of the first dielectric substrate so as to form, on the first main surface of the first dielectric substrate, (i) a first ground conductor having an opening and (ii) a metal patch as a radiation element, the metal patch being aligned to the opening in a lamination direction;

providing a second dielectric substrate having a first main surface and a second main surface opposite to the first main surface;

patterning a conductive film provided on the first main surface of the second dielectric substrate so as to form a first feed probe on the first main surface of the second dielectric substrate, the first feed probe being configured to excite the metal patch;

patterning a conductive film provided on the second main surface of the second dielectric substrate so as to form a second ground conductor on the second main surface of the second dielectric substrate;

forming a slot in the second ground conductor by etching the conductive film provided on the second main surface of the second dielectric substrate such that (i) a longitudinal direction of the slot is generally parallel to a longitudinal direction of the first feed probe and (ii) more than half of the slot along the longitudinal direction overlaps with the first feed probe along the lamination direction;

providing a third dielectric substrate having a first main surface and a second main surface opposite to the first main surface;

patterning a conductive film provided on the second main surface of the third dielectric substrate so as to form a second feed probe on the second main surface of the third dielectric substrate, the second feed probe being generally perpendicular to the slot; and

laminating the first dielectric substrate, the second dielectric substrate, and the third dielectric substrate such that the second main surface of the first dielectric substrate faces to the first main surface of the second dielectric substrate along the lamination direction and such that the second main surface of the second dielectric substrate faces to the first main surface of the third dielectric substrate along the lamination direction.

2. The method according to claim 1 , further comprising:

providing a fourth dielectric substrate having a first main surface and a second main surface opposite to the first main surface; and

patterning a conductive film provided on the second main surface of the fourth dielectric substrate so as to form a third ground conductor on the second main surface of the fourth dielectric substrate,

wherein the laminating comprises laminating the first dielectric substrate, the second dielectric substrate, the third dielectric substrate, and the fourth dielectric substrate such that the second main surface of the third dielectric substrate faces to the first main surface of the fourth dielectric substrate along the lamination direction.

3. The method according to claim 2 , further comprising:

patterning the conductive film provided on the second main surface of the third dielectric substrate so as to form a second metal patch, the second metal patch being under the second ground conductor and above the third ground conductor in the lamination direction after the laminating, and the second feed probe having a longitudinal axis which is generally perpendicular to the slot from a view parallel to the lamination direction.

4. The method according to claim 1 , further comprising:

mounting at least one metal post at a periphery of the opening.

5. The method according to claim 4 , wherein the opening has a rectangular shape, and

wherein the at least one metal post comprises a plurality of metal posts including four pairs of metal posts, each pair of metal posts being disposed along a respective one of the four sides of the periphery of the opening.

6. The method according to claim 1 , further comprising:

providing a plurality of sets each comprising the opening, the metal patch, the first feed probe, the slot, and the second feed probe;

connecting a first feed circuit to the plurality of first feed probes; and

connecting a second feed circuit to the plurality of second feed probes.

7. A method for producing a dual-polarized antenna, the method comprising:

providing a first dielectric substrate having a first main surface and a second main surface opposite the first main surface;

patterning a conductive film provided on the first main surface of the first dielectric substrate so as to form a first ground conductor having an opening on the first main surface of the first dielectric substrate;

providing a second dielectric substrate having a first main surface and a second main surface opposite the first main surface;

patterning a conductive film provided on the first main surface of the second dielectric substrate so as to form, on the first main surface of the second dielectric substrate, (i) a first metal patch as a radiation element and (ii) a first feed probe, the metal patch being aligned to the opening in a lamination direction, and the first feed probe being configured to excite the first metal patch;

patterning a conductive film provided on the second main surface of the second dielectric substrate so as to form a second ground conductor on the second main surface of the second dielectric substrate;

forming a slot in the second ground conductor by etching the conductive film provided on the second main surface of the second dielectric substrate such that (i) a longitudinal direction of the slot is generally parallel to a longitudinal direction of the first feed probe and (ii) more than half of the slot along the longitudinal direction overlaps with the first feed probe along the lamination direction;

providing a third dielectric substrate having a first main surface and a second main surface opposite to the first main surface;

patterning a conductive film provided on the second main surface of the third dielectric substrate so as to form, on the second main surface of the third dielectric substrate, (i) a second metal patch as a radiation element and (ii) a second feed probe, the second feed probe being configured to excite the second metal patch; and

laminating the first dielectric substrate, the second dielectric substrate, and the third dielectric substrate such that the second main surface of the first dielectric substrate faces to the first main surface of the second dielectric substrate along the lamination direction and such that the second main surface of the second dielectric substrate faces to the first main surface of the third dielectric substrate along the lamination direction, whereby the slot is positioned between the first and second metal patches in the lamination direction.

8. The method according to claim 7 , further comprising:

providing a fourth dielectric substrate having a first main surface and a second main surface opposite to the first main surface; and

patterning a conductive film provided on the second main surface of the fourth dielectric substrate so as to form a third ground conductor on the second main surface of the fourth dielectric substrate,

wherein the laminating comprises laminating the first dielectric substrate, the second dielectric substrate, the third dielectric substrate, and the fourth dielectric substrate such that the second main surface of the third dielectric substrate faces to the first main surface of the fourth dielectric substrate along the lamination direction.

9. The method according to claim 7 , wherein the first metal patch is smaller in area than the second metal patch, and

wherein the second metal patch is smaller in area than the opening.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 12, 2019
From: HASHIMOTO, KOH; HIGAKI, MAKOTO; MUKAI, MANABU
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 048575/0041 →
Priority Claims (1)
JP 2015-000714 · Jan 6, 2015 · national
Continuity (3)
Division 15730173 · Oct 11, 2017
Continuation 14921615 · Oct 23, 2015
Related Publication 20190207305A1 · Jul 4, 2019
Cited By (1)
US 12,431,619