IP Library Granted Patent US 10,971,347
Granted Patent B2
US 10,971,347 · App. 16/306,911 · Granted Apr 6, 2021

Charged particle beam apparatus

Inventors: Mitsuhiro Nakamura (Tokyo, JP); Hironori Itabashi (Tokyo, JP); Hirofumi Satou (Tokyo, JP); Tsutomu Saito (Tokyo, JP); Masahiro Sasajima (Tokyo, JP); Natsuki Tsuno (Tokyo, JP); Yohei Nakamura (Tokyo, JP)
Assignee: HITACHI HIGH-TECH CORPORATION
H01J49/08H01J3/26H01J3/36H01J37/147H01J49/10H01J2237/15
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Quick Facts
Patent No.
US 10,971,347
App. No.
16/306,911
Granted
Apr 6, 2021
Kind
B2
Abstract

In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun ( 12 ), scanning deflectors ( 17 and 18 ) configured to scan a charged particle beam ( 20 ) emitted from the charged particle gun ( 12 ) onto a sample ( 21 ), detectors ( 40 and 41 ) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit ( 42 ) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller ( 45 ) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

Claims (23)

1. A charged particle beam apparatus comprising:

a charged particle gun;

a scanning deflector configured to scan a charged particle beam emitted from the charged particle gun onto a sample;

a scanning control voltage generator for generating a scanning control voltage to be input to the scanning deflector;

a detector configured to detect an external scanning control voltage, which is input from an outside into the scanning deflector and is different from the scanning control voltage;

an arithmetic unit configured to calculate, based on the detected external scanning control voltage, irradiation pixel coordinates for the charged particle beam;

an irradiation controller configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

2. The charged particle beam apparatus of claim 1 , further comprising:

a secondary particle detector configured to detect secondary particles released from the sample by irradiation with the charged particle beam;

a signal processor configured to perform imaging for secondary particle data output from the secondary particle detector according to the irradiation pixel coordinates; and

an image display unit configured to display a secondary particle image imaged by the signal processor.

3. The charged particle beam apparatus of claim 2 , wherein

the irradiation controller controls an irradiation time, an interval time between irradiations, and the number of pixels between irradiations.

4. The charged particle beam apparatus of claim 1 , wherein

the irradiation controller controls an irradiation time, an interval time between irradiations, and the number of pixels between irradiations.

5. The charged particle beam apparatus of claim 1 , wherein

the charged particle beam apparatus is mounted with an energy dispersive X-ray analyzer, a backscattering electron diffractometer, or a superconducting transition-edge sensor type X-ray microcalorimeter which includes the scanning control voltage generator.

6. The charged particle beam apparatus of claim 1 , wherein

the charged particle beam apparatus includes a blanker, and

the irradiation controller controls ON/OFF of irradiation from the charged particle gun onto the sample with the charged particle beam through the blanker.

7. The charged particle beam apparatus of claim 1 , wherein

the charged particle gun is an optically-excited charged particle gun, and

the irradiation controller controls an excitation light controller of the optically-excited charged particle gun, thereby controlling ON/OFF of irradiation from the optically-excited charged particle gun onto the sample with the charged particle beam.

Assignments (3)
CONFIRMATORY LICENSE Recorded May 5, 2022
From: DUKE UNIVERSITY
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 059855/0960 →
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2018
From: NAKAMURA, MITSUHIRO; ITABASHI, HIRONORI; SATOU, HIROFUMI; SAITO, TSUTOMU; SASAJIMA, MASAHIRO; TSUNO, NATSUKI; NAKAMURA, YOHEI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 047664/0009 →