IP Library › Granted Patent US 11,029,514
Granted Patent B2
US 11,029,514 · App. 16/310,112 · Granted Jun 8, 2021

Antireflection film and its use on a substrate

Inventors: Zoltán Hórvölgyi (Budapest, HU); Emöke Albert (Budapest, HU); Lenke Kócs (Piliscaba, HU); Csaba Ferenc Major (Eger, HU); Jánosné Kabai (Budapest, HU)
Assignee: HUNGARO LUX LIGHT KFT.
G02B27/00G02B1/11C03C17/004C03C17/005C03C2217/734C03C2218/111C03C2218/113C03C2218/365C08J7/04C08J2369/00C09D5/00C09D5/006F21V3/10
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Quick Facts
Patent No.
US 11,029,514
App. No.
16/310,112
Granted
Jun 8, 2021
Kind
B2
Abstract

This disclosure relates to an antireflection film, as well as its use on a substrate ( 3 ) to decrease a fracture of light striking the substrate ( 3 ) reflected by said substrate ( 3 ), wherein said coating is formed of a transparent first layer ( 1 ) applied on the substrate ( 3 ) and a transparent second layer ( 2 ) on said first layer ( 1 ). The essence of the solutions according to this disclosure is that thickness (d 1 ) of the first layer ( 1 ) ranges from 10 to 70 nm and refractive index (n 1 ) of said first layer ( 1 ) satisfies the relation 1.05<n 1 <1.35 within the wavelength range of 375 to 1000 nm, and wherein thickness (d 2 ) of the second layer ( 2 ) ranges from 30 to 100 nm and refractive index (n 2 ) of said second layer ( 2 ) satisfies the relation 1.25<n 2 <1.5 within the wavelength range of 375 to 1000 nm, and wherein n 1 <n 2 also holds.

Claims (18)

1. An antireflection coating comprising:

a transparent first layer ( 1 ) applied on a substrate ( 3 ) of low refractive index (n substrate ); and

a transparent second layer ( 2 ) over the first layer ( 1 ),

wherein thickness (d 1 ) of the first layer ( 1 ) ranges from 10 to 70 nm and refractive index (n 1 ) of said first layer ( 1 ) satisfies 1.05<n 1 <1.35 within an entire wavelength range of 375 to 1000 nm, and

wherein thickness (d 2 ) of the second layer ( 2 ) ranges from 30 to 100 nm and refractive index (n 2 ) of said second layer ( 2 ) satisfies 1.25<n 2 <1.5 within the entire wavelength range of 375 to 1000 nm, and

wherein n 1 <n 2 .

2. The antireflection coating according to claim 1 , wherein the substrate ( 3 ) for the antireflection coating is transparent within the wavelength range of 375 to 1000 nm.

3. The antireflection coating according to claim 2 , wherein the antireflection coating is formed on both side surfaces of the substrate ( 3 ).

4. The antireflection coating according to claim 2 , wherein the substrate ( 3 ) forms an envelope or at least a part of an envelope of a light emitting device.

5. The antireflection coating according to claim 2 , wherein the substrate ( 3 ) is an optical lens.

6. The antireflection coating according to claim 1 , wherein the low refractive index (n substrate ) of said substrate ( 3 ) satisfies n substrate <2.5.

7. The antireflection coating according to claim 1 , wherein said substrate ( 3 ) is made of at least one substance chosen from the group consisting of glass, quartz glass and polycarbonate.

8. A method comprising using an antireflection coating on a substrate ( 3 ) to decrease a fraction of light striking the substrate ( 3 ) reflected by said substrate ( 3 ), wherein refractive index (n substrate ) of the substrate ( 3 ) satisfies n substrate <2.5, and wherein said antireflection coating applied on said substrate ( 3 ) is formed of a first layer ( 1 ) and a second layer ( 2 ) over the first layer ( 1 ), wherein thickness (d 1 ) of the first layer ( 1 ) ranges from 10 to 70 nm and refractive index (n 1 ) of said first layer ( 1 ) satisfies 1.05<n 1 <1.35 within a wavelength range of 375 to 1000 nm, and wherein thickness (d 2 ) of the second layer ( 2 ) ranges from 30 to 100 nm and refractive index (n 2 ) of said second layer ( 2 ) satisfies 1.25<n 2 <1.5 within the wavelength range of 375 to 1000 nm, and wherein n 1 <n 2 .

9. The method according to claim 8 , further comprising the antireflection coating decreasing the fraction of light striking the substrate reflected by said substrate ( 3 ) in a broad range of wavelengths.

10. The method according to claim 9 , wherein said broad range of wavelengths ranges from about 400 nm to about 900 nm.

11. The method according to claim 8 , further comprising the antireflection coating decreasing the fraction of light striking the substrate reflected by said substrate ( 3 ) in a broad range of angles of incidence.

12. The method according to claim 11 , wherein said broad range of angles of incidence ranges from about 0° to about 70°.

13. The method of claim 8 , wherein said substrate ( 3 ) is made of at least one substance chosen from the group consisting of glass, quartz glass and polycarbonate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 25, 2019
From: KABAI, ZOLTÁN
To: HUNGARO LUX LIGHT KFT.
Reel/Frame 048421/0898 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 8, 2019
From: HÓRVÖLGYI, ZOLTÁN; ALBERT, EMÖKE; KÓCS, LENKE; MAJOR, CSABA
To: HUNGARO LUX LIGHT KFT.
Reel/Frame 048274/0279 →
Priority Claims (1)
HU P1600384 · Jun 15, 2016 · national
Continuity (1)
Related Publication 20190177553A1 · Jun 13, 2019
Cited By (2)
US 12,481,086 US 12,535,654