IP Library Granted Patent US 10,872,744
Granted Patent B2
US 10,872,744 · App. 16/310,333 · Granted Dec 22, 2020

Charged particle beam apparatus

Inventors: Munekazu Koyanagi (Tokyo, JP); Wataru Suzuki (Tokyo, JP); Toshihide Agemura (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
H01J37/20H01J37/22H01J37/28H01J2237/2002
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,872,744
App. No.
16/310,333
Granted
Dec 22, 2020
Kind
B2
Abstract

In a charged particle beam apparatus is provided with an optical image capturing apparatus having an angle different from that of a column, a sample may collide with other components when the sample is faced toward the optical image capturing apparatus. The charged particle beam apparatus includes a stage configured to place a sample thereon and to move the sample inside a sample chamber; a column configured to observe the sample by irradiating a charged particle beam on the sample; a first image capturing apparatus configured to observe a surface of the sample irradiated with the charged particle beam from an angle different from that of the column; and a control unit configured to, when observing the sample via the first image capturing apparatus, separate the sample from the column and to tilt the sample through the stage to face toward the first image capturing apparatus.

Claims (33)

1. A charged particle beam apparatus comprising:

a stage configured to place a sample thereon and to move the sample inside a sample chamber;

a column of a scanning electron microscope configured to irradiate a charged particle beam on the sample by outputting the charged particle beam in a direction perpendicular to an upper surface of the stage;

a first image capturing apparatus configured to observe a surface of the sample irradiated with the charged particle beam from an angle different from that of the column and obtain an optical image of the sample; and

a control unit configured to, when observing the sample via the first image capturing apparatus, separate the sample from the column by moving the sample in a vertical direction away from the column and, subsequently, to tilt the sample through the stage to face toward the first image capturing apparatus;

wherein the control unit corrects a magnification and coordinates of the first image capturing apparatus according to a position of the sample when observing the sample by using the first image capturing apparatus.

2. The charged particle beam apparatus according to claim 1 , further comprising:

a second image capturing apparatus configured to observe a side surface of the sample; and

a display unit, wherein

the control unit displays an image obtained by the second image capturing apparatus on the display unit when the sample faces toward the first image capturing apparatus.

3. The charged particle beam apparatus according to claim 1 , further comprising:

a second image capturing apparatus configured to observe a side surface of the sample, wherein

the control unit determines the possibility of collision between the sample and other components based on an image obtained by the second image capturing apparatus when the sample faces toward the first image capturing apparatus.

4. The charged particle beam apparatus according to claim 3 , wherein

the control unit controls the movement of the sample by the stage so as to further separate the sample from the first image capturing apparatus when it is determined that the possibility of collision between the sample and other components is high.

5. The charged particle beam apparatus according to claim 1 , wherein

when the sample is larger than the field of view of the first image capturing apparatus, the control unit observes the sample by the first image capturing apparatus while rotating the sample by using the stage.

6. A method of observing a sample comprising:

irradiating the sample in a first position with a charged particle beam from a column of a scanning electron microscope by outputting the charged particle beam in a direction perpendicular to an upper surface of a stage on which the sample is located;

obtaining an optical image of a surface of the sample irradiated with the charged particle beam by a first image capturing apparatus provided in a direction different from that of the column with respect to the sample;

separating the sample from the column by moving the sample in a vertical direction away from the column and, subsequently, tilting the sample to a second position different from the first position such that the sample faces toward the first image capturing apparatus;

observing the sample in the second position by the first image capturing apparatus; and

correcting a magnification and coordinates of the first image capturing apparatus according to a position of the sample when observing the sample by using the first image capturing apparatus.

7. The method of observing a sample according to claim 6 , wherein

a side surface of the sample is observed by a second image capturing apparatus, and

in order to observe the sample by the first image capturing apparatus, an image obtained by the second image capturing apparatus is displayed on a display unit when the sample faces toward the first image capturing apparatus.

8. The method of observing a sample according to claim 6 , wherein

a side surface of the sample is observed by a second image capturing apparatus, and

when the sample faces toward the first image capturing apparatus, the possibility of collision between the sample and other components is determined from an image obtained by the second image capturing apparatus.

9. The method of observing a sample according to claim 8 , wherein

when it is determined that the possibility of collision between the sample and other components is high, the sample is further separated from the first image capturing apparatus.

10. The method of observing a sample according to claim 6 , wherein

when the sample is larger than the field of view of the first image capturing apparatus, the sample is observed by using the first image capturing apparatus while rotating the sample.

Assignments (2)
CHANGE OF NAME Recorded Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 8, 2019
From: KOYANAGI, MUNEKAZU; SUZUKI, WATARU; AGEMURA, TOSHIHIDE
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 047932/0894 →
Continuity (1)
Related Publication 20190148105A1 · May 16, 2019