IP Library › Granted Patent US 10,759,678
Granted Patent B2
US 10,759,678 · App. 16/313,245 · Granted Sep 1, 2020

Dilute chemical solution producing apparatus and dilute chemical solution producing method

Inventors: Yu Fujimura (Tokyo, JP); Nobuko Gan (Tokyo, JP); Hiroto Tokoshima (Tokyo, JP)
Assignee: KURITA WATER INDUSTRIES LTD.
C02F1/20B01D19/0005B01D19/0031B01D19/0036B01D19/0068B01F1/00B01F5/06B01J23/42B08B3/08C02F1/58C02F1/68G03F1/82H01L21/02052H01L21/304C02F1/444C02F2103/04
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,759,678
App. No.
16/313,245
Granted
Sep 1, 2020
Kind
B2
Abstract

A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.

Claims (6)

1. A dilute chemical solution producing apparatus for diluting a chemical solution with ultrapure water, sequentially comprising, in an ultrapure water supply line, a platinum group metal carrying resin column and a membrane-type deaeration apparatus, a chemical solution injection apparatus being provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus.

2. The dilute chemical solution producing apparatus according to claim 1 , wherein an inert gas dissolving membrane apparatus is provided downstream of the membrane-type deaeration apparatus.

3. The dilute chemical solution producing apparatus according to claim 1 , wherein the membrane-type deaeration apparatus is of an inert gas suction type.

4. A dilute chemical solution producing method for diluting a chemical solution with ultrapure water, wherein the ultrapure water for dilution is passed through a platinum group metal carrying resin column, then a chemical solution component is added to prepare a dilute chemical solution, and then the obtained dilute chemical solution is deaerated.

5. The dilute chemical solution producing method according to claim 4 , wherein an inert gas is dissolved in the deaerated dilute chemical solution.

6. The dilute chemical solution producing method according to claim 4 , wherein the deaeration is performed while an inert gas is sucked into a gas phase side.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 21, 2020
From: FUJIMURA, YU; GAN, NOBUKO; TOKOSHIMA, HIROTO
To: KURITA WATER INDUSTRIES LTD.
Reel/Frame 052724/0745 →
Priority Claims (1)
JP 2016-183087 · Sep 20, 2016 · national
Continuity (1)
Related Publication 20190233307A1 · Aug 1, 2019
Cited By (1)
US 12,595,196