IP Library Granted Patent US 11,241,768
Granted Patent B2
US 11,241,768 · App. 16/324,516 · Granted Feb 8, 2022

Magnetic polishing machine

Inventor: Tsugio Yamazaki (Tokyo, JP)
Assignees: Tsugio Yamazaki; Priority Co., Ltd.
B24B31/102B24B1/005B24B31/033B24B31/112B24B37/042
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Quick Facts
Patent No.
US 11,241,768
App. No.
16/324,516
Granted
Feb 8, 2022
Kind
B2
Abstract

A magnetic polishing machine includes a container which accommodates a polishing target and a plurality of polishing pieces, a plurality of rotation plates which are rotatably disposed below the container while a magnet is attached to the rotation plate, and a first rotation mechanism which rotates each rotation plate about a rotation axis of the rotation plate. The adjacent rotation plates are disposed at a position in which rotation areas thereof partially overlap each other.

Claims (23)

1. A magnetic polishing machine comprising:

a container which accommodates a polishing target and a plurality of magnetic polishing pieces:

a plurality of rotation plates rotatably disposed below the container, wherein each of the plurality of rotation plates rotates about a respective rotation axis, and wherein each rotation plate has a magnet attached thereto; and

a first rotation mechanism which rotates each rotation plate about its respective rotation axis,

wherein rotation of each of the rotation plates defines a respective plate rotation area and the plurality of rotation plates are positioned such that adjacent plate rotation areas partially overlap each other, such that rotation of the plurality of rotation plates causes a magnetic field to move the magnetic polishing pieces to polish the target.

2. The magnetic polishing machine according to claim 1 ,

wherein the container is disposed above the plurality of rotation plates in a fixed manner.

3. The magnetic polishing machine according to claim 1 ,

wherein the rotation axis of each rotation plate passes through the container.

4. The magnetic polishing machine according to claim 1 ,

wherein four rotation plates are disposed below the container.

5. The magnetic polishing machine according to claim 4 ,

wherein each rotation plate has a deformed elliptical shape in which a center portion is thin and both end portions are thick and includes a first portion and a second portion extending in mutually opposite directions from the rotation axis of the rotation plate, and

wherein a plurality of the magnets are attached to each of the first portion and the second portion.

6. The magnetic polishing machine according to claim 1 ,

wherein each rotation plate is formed in a shape which maintains a substantially uniform separation distance with respect to an adjacent rotation plate when the rotation plates are rotated by the first rotation mechanism.

7. The magnetic polishing machine according to claim 1 ,

wherein the magnet comprises a first magnet and a second magnet, wherein the first magnet is disposed so that a first upper surface portion of each plate becomes an N pole and the second magnet is disposed so that a second upper surface portion of each plate becomes an S pole.

8. The magnetic polishing machine according to claim 1 ,

wherein a first magnet is disposed so that an upper surface portion of one rotation plate becomes an N pole, or a second magnet is disposed so that an upper surface portion of one rotation plate becomes an S pole.

9. The magnetic polishing machine according to claim 1 , further comprising:

a support member coupled to the rotation plates; and

a second rotation mechanism which rotates the support member.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 8, 2019
From: YAMAZAKI, TSUGIO
To: YAMAZAKI, TSUGIO; PRIORITY CO., LTD.
Reel/Frame 048283/0774 →
Continuity (1)
Related Publication 20200047306A1 · Feb 13, 2020