Core-shell heterostructures composed of metal nanoparticle core and transition metal dichalcogenide shell
Provided herein are core-shell heterostructures design comprising a metal (e.g., noble metal) nanoparticle core and a transition metal dichalcogenide (TMD) shell, and methods of preparation and use thereof. In particular embodiments, the core-shell heterostructures described herein are synthesized by direct growth of a monolayer or multilayer fullerene-like TMD shell on a metal (e.g., noble metal) nanoparticle core, exhibit unique Raman scattering and photoluminescence characteristics, and are useful, for example, in plasmonic hot electron enhanced optics and optoelectronics.
1. A heterostructure composition comprising a metal core encapsulated within a transition metal dichalcogenide (TMD) shell, wherein the metal core is a noble metal core, wherein the noble metal core comprises a single phase or alloy of gold (Au), silver (Ag), platinum (Pt), Palladium (Pd), Ruthenium (Ru), Rhodium (Rh), Iridium (Ir), or Osmium (Os), wherein the TMD shell comprises molybdenum disulfide (MoS 2 ), tungsten disulfide (WS 2 ), rhenium disulfide (ReS 2 ), molybdenum diselenide (MoSe 2 ), tungsten diselenide (WSe 2 ), or Molybdenum ditelluride (MoTe 2 ), wherein the metal core is 5-200 nm in diameter; and wherein the TMD shell is 0.65-32.5 nm thick.
2. The composition of claim 1 , wherein the noble metal core comprises gold (Au).
3. The composition of claim 1 , wherein the TMD shell comprises MoS 2 , MoSe 2 , or MoTe 2 .
4. The composition of claim 1 , wherein the TMD shell comprises WS 2 or WSe 2 .
5. The composition of claim 1 , wherein the TMD shell comprises 1-50 layers.
6. A method for preparing the composition of claim 1 comprising directly growing a monolayer or multilayer of the TMD shell on the metal core.
7. The method of claim 6 , wherein the monolayer or multilayer TMD shell is grown by chemical vapor deposition.
8. The method of claim 6 , wherein the metal core is formed by coating a metal film onto a Si substrate via galvanic deposition or physical evaporation followed by high-temperature annealing.
9. The method of claim 8 , wherein the metal-coated Si substrate is placed in a tube furnace and transition metal oxide and sulfur powder is carried over the substrate to form the TMD shell on the metal core.
10. A photodetector device comprising the composition of claim 1 .
11. A composition comprising the composition of claim 1 patterned onto a substrate.