IP Library Granted Patent US 11,027,982
Granted Patent B2
US 11,027,982 · App. 16/332,042 · Granted Jun 8, 2021

Mica-made member, electrochemical reaction unit, and electrochemical reaction cell stack

Inventors: Satoru Ishida (Nagoya, JP); Tomoki Murata (Nagoya, JP); Ryoji Tanimura (Nagoya, JP); Tatsuya Ono (Nagoya, JP); Nobuyuki Hotta (Nagoya, JP)
Assignee: MORIMURA SOFC TECHNOLOGY CO., LTD.
C01B33/42C25B9/00C25B9/70H01M8/02H01M8/242H01M8/2457H01M8/2483H01M8/12
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Quick Facts
Patent No.
US 11,027,982
App. No.
16/332,042
Granted
Jun 8, 2021
Kind
B2
Abstract

A mica-made member having a crystal structure exhibiting an intensity peak of KMg 3 (Si 3 Al)O 10 (OH) 2 and an intensity peak of Mg 2 SiO 4 in X-ray diffractometry (XRD). Also disclosed is an electrochemical reaction unit including a structural member formed of the mica-made member and an electrochemical reaction cell stack.

Claims (11)

1. An electrochemical reaction cell stack comprising a plurality of electrochemical reaction units arrayed in a first direction,

wherein at least one of the electrochemical reaction units is an electrochemical reaction unit,

the electrochemical reaction unit includes:

a unit cell including an electrolyte layer, and a cathode and an anode that face each other in a first direction with the electrolyte layer intervening therebetween; and

a structural member that faces a cathode chamber facing the cathode or an anode chamber facing the anode,

wherein the structural member is formed of a mica-made member that has been subjected to a heat treatment of 1,000° C. or higher for four or more hours so as to exhibit an intensity peak of KMg 3 (Si 3 Al)O 10 (OH) 2 and an intensity peak of Mg 2 SiO 4 in X-ray diffractometry (XRD), prior to assembling the structural member into the electrochemical reaction unit.

2. The electrochemical reaction cell stack according to claim 1 , wherein the ratio of the intensity of a peak of the (120) plane of Mg 2 SiO 4 to the intensity of a peak of the (003) plane of KMg 3 (Si 3 Al)O 10 (OH) 2 is 0.001 or more.

3. The electrochemical reaction cell stack according to claim 1 , wherein the ratio of the intensity of the peak of the (120) plane of Mg 2 SiO 4 to the intensity of the peak of the (003) plane of KMg 3 (Si 3 Al)O 10 (OH) 2 is 0.15 or less.

4. The electrochemical reaction cell stack according to claim 1 , wherein the ratio of the intensity of the peak of the (120) plane of Mg 2 SiO 4 to the intensity of the peak of the (003) plane of KMg 3 (Si 3 Al)O 10 (OH) 2 is 0.003 or more.

5. The electrochemical reaction cell stack according to claim 1 , wherein the ratio of the intensity of the peak of the (120) plane of Mg 2 SiO 4 to the intensity of the peak of the (003) plane of KMg 3 (Si 3 Al)O 10 (OH) 2 is 0.029 or less.

6. The electrochemical cell stack according to claim 1 , wherein the structural member formed of a mica-made member is subjected to heat treatment prior to assembly so as to reduce Si scattering of the mica upon operation of the assembled electrochemical reaction unit.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 27, 2020
From: NGK SPARK PLUG CO., LTD.
To: MORIMURA SOFC TECHNOLOGY CO., LTD.
Reel/Frame 052249/0538 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 11, 2019
From: ISHIDA, SATORU; MURATA, TOMOKI; TANIMURA, RYOJI; ONO, TATSUYA; HOTTA, NOBUYUKI
To: NGK SPARK PLUG CO., LTD.
Reel/Frame 048558/0322 →
Priority Claims (1)
JP JP2016-178409 · Sep 13, 2016 · national
Continuity (1)
Related Publication 20190218104A1 · Jul 18, 2019