Pattern measurement device, and computer program
A purpose of the present invention is to provide a pattern measurement device that allows the selection of device conditions for calculating proper variability and allows the estimation of proper variability. The present invention provides a pattern measurement device comprising a computation processing device that, on the basis of a plurality of measured values acquired by a charged particle radiation device, calculates the variability of the measured values of a pattern that is the object of measurement, said pattern measurement device characterized in that a variability σ measured of the plurality of measured values formed at different positions and σ 2 observed =σ 2 pattern /Np+σ 2 sem0 /(Np·Nframe) are used to calculate σ SEM0 , which indicates measurement reproducibility error. σ pattern0 is the variability due to pattern shape error, Np is the number of measurement points, and Nframe is a value that changes according to device conditions.
1. A pattern measurement device including a computation processing device that, on a basis of a plurality of measured values acquired by a charged particle radiation device, calculates a variability of the measured values of a pattern that is an object of measurement, the pattern measurement device comprising:
a storage medium that stores the measured values of a pattern, wherein
the computation processing device is configured to calculate, using a variability σ measured of the plurality of measured values formed at different positions, and an following expression including following parameters, σ SEM0 which indicates a measurement reproducibility error:
σ 2 observed −σ 2 pattern0 /Np+σ 2 sem0 /( Np·N frame) [Expression]
[Parameters]
σ pattern0 : a variability due to a pattern shape error
Np: a number of measurement points
Nframe: a value that changes according to device conditions.
2. The pattern measurement device according to claim 1 , wherein
the Nframe is a number of frames of the charged particle radiation device.
3. The pattern measurement device according to claim 2 , wherein
the computation processing device calculates the Nframe with which σ 2 pattern0 /Np+σ 2 sem0 /(Np·Nframe) satisfies a predetermined condition.
4. The pattern measurement device according to claim 1 , wherein
the computation processing device calculates a variability σ 2 CDpatterno based on a following expression having following parameters:
σ 2 CDpattern0 ·Np·σ 2 CDobserved −σ 2 CDsem0 /N frame [Expression]
5. The pattern measurement device according to claim 1 , wherein
the plurality of measured values are values measured at different timings and different positions.
6. A storage medium that stores a computer program which is readable by a computer and which enables the computer to calculate, on a basis of a plurality of measured values acquired by a charged particle radiation device, a variability of the measured values of a pattern that is an object of measurement, wherein
the computer program causes the computer to calculate, using a variability σ measured of the plurality of measured values formed at different positions, and a following expression including following parameters, σ SEM0 which indicates a measurement reproducibility error:
σ 2 observed =σ 2 pattern0 /Np+σ 2 sem0 /( Np·N frame) [Expression]
[Parameters]
σ pattern0 : a variability due to a pattern shape error
Np: a number of measurement points
Nframe: a value that changes according to device parameters.