Method for manufacturing display substrate, display substrate and display device
A method for manufacturing a display substrate, a display substrate and a display device are provided. The method for manufacturing a display substrate includes: forming, on a base substrate, a concave-convex structure extending in a direction identical to an extending direction of a signal transmission line; and forming the signal transmission line on the concave-convex structure.
1. A display substrate, comprising:
a base substrate;
a concave-convex structure arranged on the base substrate; and
a signal transmission line arranged on the concave-convex structure,
wherein an extending direction of the concave-convex structure is the same as an extending direction of the signal transmission line,
wherein the display substrate further comprises an insulating layer arranged on the base substrate, and a complementary data line having a same extending direction as an extending direction of a data line,
wherein the signal transmission line comprises the data line,
wherein the concave-convex structure comprises a via-hole penetrating the insulating layer,
wherein an orthographic projection of the complementary data line onto the base substrate at least partially overlaps an orthographic projection of the data line onto the base substrate, and the complementary data line is connected to the data line via the via-hole, and
wherein the display substrate further comprises a scanning line, there is a projection region of the scanning line projected onto the complementary data line, the projection region is a region where an orthographic projection of the scanning line onto the base substrate overlaps the orthographic projection of the complementary data line onto the base substrate, and a hollowed-out pattern is arranged in the complementary data line at the projection region.
2. The display substrate according to claim 1 , wherein the signal transmission line is located on the insulating layer.
3. The display substrate according to claim 1 , further comprising an active layer of a thin film transistor, wherein the active layer is arranged in a same layer with the complementary data line, and each of the complementary data line, a source electrode contact region of the active layer and a drain electrode contact region of the active layer comprises polysilicon that is heavily doped.
4. The display substrate according to claim 1 , wherein the scanning line intersects with the data line, there is another projection region of the scanning line projected onto the data line, the another projection region is a region where the orthographic projection of the scanning line onto the base substrate overlaps the orthographic projection of the data line onto the base substrate, and another hollowed-out pattern is arranged in the data line at the another projection region.
5. The display substrate according to claim 1 , further comprising: a source electrode and a drain electrode of a thin film transistor arranged in a same layer as the data line, wherein the data line, the source electrode and the drain electrode are formed through one patterning process.
6. The display substrate
according to claim 1 , wherein the insulating layer is further provided with a source electrode via-hole and a drain electrode via-hole, and the via-hole, the source electrode via-hole and the drain electrode via-hole are formed through one patterning process.