Semiconductor body
A semiconductor body is disclosed. In an embodiment a semiconductor body includes an n-doped region comprising a first layer sequence comprising pairs of alternating layers, wherein a first layer and a second layer of each pair differ in their doping concentration, and wherein the first and second layers of each pair have the same material composition except for their doping and a second layer sequence comprising pairs of alternating layers, wherein a first layer and a second layer of each pair differ in their material composition, an active region, wherein the second layer sequence is disposed between the first layer sequence and the active region and a p-doped region, wherein the active region is disposed between the n-doped region and the p-doped region.
1. A semiconductor body comprising:
an n-doped region comprising:
a first layer sequence comprising pairs of alternating layers, wherein a first and a second layer of each pair differ in their doping concentration, and wherein the first and second layers of each pair have the same material composition except for their doping; and
a second layer sequence comprising pairs of alternating layers, wherein a first layer and a second layer of each pair differ in their material composition;
an active region, wherein the second layer sequence is disposed between the first layer sequence and the active region; and
a p-doped region,
wherein the active region is disposed between the n-doped region and the p-doped region.
2. The semiconductor body according to claim 1 , wherein a number of pairs of the first layer sequence is at least three and at most five.
3. The semiconductor body according to claim 1 , wherein the first layer of each pair of the first layer sequence is doped and the second layer of each pair of the first layer sequence is undoped.
4. The semiconductor body according to claim 1 , wherein the n-doped region and the p-doped region are based on a nitride compound semiconductor material and the first layer sequence of the n-doped region is free of indium.
5. The semiconductor body in accordance with claim 1 , wherein the active region is configured to generate or detect electromagnetic radiation.
6. The semiconductor body according to claim 1 , further comprising an intermediate layer having a dopant concentration of at least 1*10 18 1/cm 3 between the first layer sequence and the second layer sequence.
7. The semiconductor body according to claim 6 , wherein the intermediate layer is topographically flat.
8. The semiconductor body according to claim 1 , wherein a layer thickness of the first layer of the first layer sequence is at least 1 nm and at most 30 nm, and wherein a layer thickness of the second layer of the first layer sequence is at least 30 nm and at most 100 nm.
9. The semiconductor body according to claim 1 , wherein a number of pairs of the first layer sequence is at least 1 and at most 10.
10. The semiconductor body according to claim 1 , wherein the first layer of the first layer sequence has a dopant concentration of at most 1*10 18 1/cm 3 .
11. The semiconductor body according to claim 1 , wherein a layer thickness of the second layer sequence is less than or equal to 50 nm.