IP Library › Granted Patent US 10,923,306
Granted Patent B2
US 10,923,306 · App. 16/351,956 · Granted Feb 16, 2021

Ion source with biased extraction plate

Inventors: Svetlana B. Radovanov (Brookline, MA); Bon-Woong Koo (Andover, MA); Alexandre Likhanskii (Malden, MA)
Assignee: Applied Materials, Inc.
H01J27/024H01J27/08
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Quick Facts
Patent No.
US 10,923,306
App. No.
16/351,956
Granted
Feb 16, 2021
Kind
B2
Abstract

An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

Claims (35)

1. An indirectly heated cathode ion source, comprising:

an arc chamber, comprising:

a body comprising a plurality of walls connecting a first end and a second end, wherein the body is electrically conductive; and

an extraction plate comprising an extraction aperture through which ions are extracted, which is electrically conductive and electrically isolated from the body using insulators, wherein the body and the extraction plate form a closed volume;

an indirectly heated cathode disposed on the first end of the arc chamber;

an extraction power supply in communication with the extraction plate; and

a controller in communication with the extraction power supply to allow the indirectly heated cathode ion source to operate in a plurality of modes, wherein one of the plurality of modes comprises a cleaning mode, wherein during the cleaning mode, ions from within the arc chamber bombard the extraction plate.

2. The indirectly heated cathode ion source of claim 1 , wherein the extraction power supply is a bipolar power supply.

3. The indirectly heated cathode ion source of claim 1 , wherein the extraction power supply supplies a pulsed DC voltage to the extraction plate.

4. The indirectly heated cathode ion source of claim 1 , wherein the indirectly heated cathode is electrically connected to the body.

5. The indirectly heated cathode ion source of claim 1 , wherein, in one or more of the plurality of modes, the extraction plate is biased at a different potential than the body.

6. A method of operating the indirectly heated cathode ion source of claim 1 , comprising:

ionizing a feedgas in the arc chamber;

applying a DC voltage to the extraction plate;

applying a negative voltage to an electrode disposed outside the arc chamber proximate the extraction aperture to extract ions through the extraction aperture; and

applying a cleaning voltage, different from the DC voltage, to the extraction plate, to clean the arc chamber.

7. The method of claim 6 , wherein the DC voltage is equal to a voltage applied to the body of the arc chamber.

8. The method of claim 6 , wherein the DC voltage is more positive than a voltage applied to the body of the arc chamber.

9. The method of claim 6 , wherein the cleaning voltage is a DC voltage that is more negative than a voltage applied to the body of the arc chamber.

10. The method of claim 6 , wherein the cleaning voltage comprises a pulsed DC voltage transitioning between a negative voltage and a second voltage, wherein the second voltage is equal to or greater than a voltage applied to the body of the arc chamber.

11. The method of claim 6 , wherein the negative voltage is applied to the electrode while the cleaning voltage is being applied to the extraction plate so that ions are extracted while the arc chamber is being cleaned.

12. The indirectly heated cathode ion source of claim 1 , wherein ions are extracted through the extraction aperture during the cleaning mode.

13. The indirectly heated cathode ion source of claim 1 , wherein one of the plurality of modes comprises an enhanced operating mode.

14. The indirectly heated cathode ion source of claim 13 , wherein a plasma density at the extraction aperture is increased by at least 100% during the enhanced operating mode.

15. An indirectly heated cathode ion source, comprising:

an arc chamber, comprising:

a body comprising a plurality of walls connecting a first end and a second end; and

an extraction plate comprising an extraction aperture through which ions are extracted, electrically isolated from the body using insulators, wherein the body and the extraction plate form a closed volume;

an indirectly heated cathode disposed on the first end of the arc chamber; and

an extraction power supply in communication with the extraction plate,

wherein the extraction power supply supplies a pulsed DC voltage to the extraction plate, wherein the pulsed DC voltage transitions from a negative voltage to a second voltage, wherein the second voltage is equal to or greater than a voltage applied to the body, such that, when the extraction plate is biased at the negative voltage, the indirectly heated cathode ion source operates in a cleaning mode, wherein ions from within the arc chamber bombard the extraction plate.

16. The indirectly heated cathode ion source of claim 15 , further comprising:

an electrode disposed outside the arc chamber and proximate the extraction aperture; wherein a negative voltage is applied to the electrode, so that ions are extracted through the extraction aperture while the pulsed DC voltage is applied to the extraction plate.

17. An indirectly heated cathode ion source, comprising: an arc chamber, comprising: a body comprising a plurality of walls connecting a first end and a second end, wherein the body is electrically conductive; and an extraction plate comprising an extraction aperture through which ions are extracted, which is electrically conductive and electrically isolated from the body using insulators, wherein the body and the extraction plate form a closed volume; an indirectly heated cathode disposed on the first end of the arc chamber; an extraction power supply in communication with the extraction plate; and a controller in communication with the extraction power supply to allow the indirectly heated cathode ion source to operate in a plurality of modes, wherein one of the plurality of modes comprises an enhanced operating mode; wherein a plasma density at the extraction aperture is increased by at least 100% during the enhanced operating mode; and wherein, in the enhanced operating mode, the extraction plate is positively biased relative to the body.

18. The indirectly heated cathode ion source of claim 17 , wherein the indirectly heated cathode is electrically connected to the body.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 6, 2019
From: RADOVANOV, SVETLANA B.; KOO, BON-WOONG; LIKHANSKII, ALEXANDRE
To: APPLIED MATERIALS, INC.
Reel/Frame 049087/0026 →
Continuity (1)
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