Charged particle beam device
An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.
1. A beam aperture angle adjusting method for adjusting a beam aperture angle of a charged particle beam device, the method comprising:
measuring a dimension of a pattern using a first charged particle beam device and outputting a first dimension value, based on a first signal generated by the first charged particle beam;
introducing a sample on which the pattern is formed into a second charged particle beam device;
measuring a dimension of the pattern using the second charged particle beam device and outputting a second dimension value, based on a second signal generated by the second charged particle beam;
determining the beam aperture angle based on a relationship between a taper angle of the pattern and a signal intensity of the first and second signals; and
adjusting the beam aperture angle by adjusting, in combination, a focusing lens and an objective lens of the second charged particle beam device so as to make the second dimension value same as the first dimension value or within a predetermined range with reference to the first dimension value.
2. A charged particle beam device, comprising:
a plurality of lenses configured to converge a beam emitted from a charged particle source, the plurality of lenses including at least a focusing lens;
a control device configured to control the plurality of lenses so as to set a focus at a predetermined height of a sample and adjust a beam aperture angle;
a detector configured to detect a particle generated by irradiating the sample with a charged particle beam; and
a processor configured to process output signals of the detector, wherein
the processor measures a dimension of a pattern formed on the sample based on a first detection signal obtained by beam scanning of the pattern formed on the sample, measures the dimension of the pattern based on a second detection signal, and determines the beam aperture angle based on a relationship between a taper angle of the pattern and a signal intensity of the first and second detection signals, and
the control device controls the beam aperture angle by adjusting the plurality of lenses so as to make the dimension value become a predetermined value.
3. The method according to claim 1 , wherein a focusing point is fixed at a certain height by controlling the objective lens, and the beam aperture angle is changed by controlling the focusing lens.
4. The method according to claim 1 , wherein the pattern is a hole or a groove.
5. The device according to claim 2 , wherein the pattern is a hole or a groove.