IP Library Granted Patent US 11,126,403
Granted Patent B2
US 11,126,403 · App. 16/367,623 · Granted Sep 21, 2021

True random number generator (TRNG) circuit using a diffusive memristor

Inventors: Jianhua Yang (Hadley, MA); Qiangfei Xia (Amherst, MA); Hao Jiang (Sunderland, MA)
Assignee: University of Massachusetts
G06F7/588H01L45/085H01L45/1253H01L45/1266H01L45/146H03K3/84H03K19/20H04L9/0869
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Quick Facts
Patent No.
US 11,126,403
App. No.
16/367,623
Granted
Sep 21, 2021
Kind
B2
Abstract

A true random number generator device based on a diffusive memristor is disclosed. The random number generator device includes a diffusive memristor driven by a pulse generator circuit. The diffusive memristor produces a stochastically switched output signal. A comparator circuit receives the stochastically switched output signal from the diffusive memristor and generates an output signal having a random pulse width. An AND gate logic circuit is driven by a clock signal and the output signal from the comparator circuit. The AND gate logic circuit produces a combined output signal. A counter circuit receives the combined output signal from the AND gate logic circuit and generates a random bit string output signal.

Claims (15)

1. A diffusive memristor comprising:

a bottom electrode;

a top electrode formed opposite the bottom electrode;

a dielectric layer disposed between the top electrode and the bottom electrode, the dielectric layer comprising silver doped silicon oxide (Ag:SiO x ); and

a silver (Ag) layer formed between the dielectric layer and the top electrode.

2. The diffusive memristor of claim 1 , wherein the silver layer includes a reservoir of silver atoms that are used for forming conduction channels in the dielectric layer during switching.

3. The diffusive memristor of claim 1 , wherein at least one of the bottom electrode or the top electrode includes a layer of one of platinum (Pt), palladium (Pd) or titanium nitride (TiN).

4. The diffusive memristor of claim 1 , wherein the diffusive memristor is formed on a substrate.

5. A diffusive memristor comprising:

a bottom electrode;

a top electrode formed opposite the bottom electrode;

a dielectric layer disposed between the top electrode and the bottom electrode, the dielectric layer comprising an oxide doped with a metal; and

a layer of the metal formed between the dielectric layer and the top electrode.

6. The diffusive memristor of claim 5 , wherein the oxide includes a silicon oxide (SiO x ) and the metal includes one of silver (Ag), copper (Cu) or lithium (Li).

7. The diffusive memristor of claim 5 , wherein at least one of the top electrode or the bottom electrode includes one of platinum (Pt), palladium (Pd) or titanium nitride (TiN).

Assignments (2)
CONFIRMATORY LICENSE Recorded Sep 20, 2019
From: UNIVERSITY OF MASSACHUSETTS, AMHERST
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 050456/0700 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 19, 2019
From: YANG, JIANHUA; XIA, QIANGFEI; JIANG, HAO
To: UNIVERSITY OF MASSACHUSETTS
Reel/Frame 048942/0030 →
Continuity (2)
Provisional Application 62649072 · Mar 28, 2018
Related Publication 20190303104A1 · Oct 3, 2019
Cited By (3)
US 12,293,281 US 12,333,275 US 12,640,200