Methods and devices for microelectromechanical resonators
MEMS based sensors, particularly capacitive sensors, potentially can address critical considerations for users including accuracy, repeatability, long-term stability, ease of calibration, resistance to chemical and physical contaminants, size, packaging, and cost effectiveness. Accordingly, it would be beneficial to exploit MEMS processes that allow for manufacturability and integration of resonator elements into cavities within the MEMS sensor that are at low pressure allowing high quality factor resonators and absolute pressure sensors to be implemented. Embodiments of the invention provide capacitive sensors and MEMS elements that can be implemented directly above silicon CMOS electronics.
1. A MEMS device comprising:
a membrane formed within a device layer;
an upper cavity formed within a top layer, wherein the upper cavity includes a first island at a first predetermined location; and
a lower cavity formed within a handling layer, wherein the lower cavity includes a second island at a second predetermined location, wherein the device layer is bonded to the handling layer and the top layer is bonded to the device layer, and wherein the membrane is anchored by the first and second islands.
2. The MEMS device according to claim 1 , wherein:
the membrane is anchored by the first and second islands at a periphery of the membrane.
3. The MEMS device according to claim 1 , wherein:
the membrane forms part of a MEMS resonator.
4. The MEMS device according to claim 3 , wherein:
the MEMS resonator comprises at least one of a disk resonator, a square resonator, a breathing mode resonator, a multi-ring breathing mode resonator, a Lame resonator, or a wine-glass mode resonator.
5. The MEMS device according to claim 1 , further comprising:
at least one through silicon via within the top layer; and
electrode metallization upon the top layer on the opposite side to the upper cavity.
6. The MEMS device according to claim 1 , further comprising:
a CMOS electronics circuit which is attached to the top layer on the opposite side to the upper cavity.
7. A method comprising:
forming a lower cavity within a handling layer such that the lower cavity includes a first island at a first predetermined location;
bonding a device layer to the handling layer;
processing the bonded device and handling layers in order to form a membrane within the device layer which is released from the device and handling layers;
forming an upper cavity within a top layer such that the upper cavity includes a second island at a second predetermined location; and
bonding the top layer to the bonded device and handling layers within a predetermined pressure environment in order to seal the membrane within a cavity formed by the upper cavity and the lower cavity and cause the membrane to be anchored by the first and second islands.
8. The method according to claim 7 , wherein:
causing the membrane to be anchored by the first and second islands comprises causing the membrane to be anchored by the first and second islands at a periphery of the membrane.
9. The method according to claim 7 , wherein:
the device layer, top layer, and handling layer are all separate semiconductor substrates.
10. The method according to claim 7 , wherein:
the membrane forms part of a MEMS resonator.
11. The method according to claim 10 , wherein:
the MEMS resonator comprises at least one of a disk resonator, a square resonator, a breathing mode resonator, a multi-ring breathing mode resonator, a Lame resonator, or a wine-glass mode resonator.
12. The method according to claim 7 , further comprising:
forming at least one through silicon via within the top layer; and
forming electrode metallization upon the top layer on the opposite side to the upper cavity.
13. The method according to claim 7 , further comprising:
attaching a CMOS electronics circuit to the top layer on the opposite side to the upper cavity.