System and method for dynamically stimulating bone growth

1. A system for electrical stimulation in an orthopedic implant comprising:

at least one implantable component that comprises:

a spinal cage implant body,

a set of at least three electrodes conductively isolated from the implant body and exposed at a set of distinct electrode sites on the implant body, and

implant circuitry that comprises circuitry to drive an electrical current implant control circuitry configured to control current flow of the set of electrodes, wherein each of the set of electrodes is conductively coupled to the implant control circuitry and is conductively isolated from each of the remaining electrodes in the set of electrodes, wherein the conductive coupling to each of the at least three electrodes are individually drivable between at least three states that include anode, cathode, and passive.

2. The system of claim 1 , wherein the control circuitry is configured to update the polarity of an electrode and magnitude of the electrical current flowing through the electrode in the set of electrodes.

3. The system of claim 2 , wherein the electrode is set as a cathode in a first stimulation mode state of the control circuitry and as an anode in a second stimulation mode state of the control circuitry.

4. The system of claim 1 , wherein the set of electrode sites are exposed on external surfaces of the spinal cage implant body and implant circuitry is integrated within the structure of the spinal cage.

5. The system of claim 1 , wherein the implant body is a substantially flexible surface film structure.

6. The system of claim 1 , wherein the implant control circuitry is additionally configured to selectively operate in an impedance monitoring mode; wherein, when an impedance monitoring mode, the control circuitry is configured to measure the impedance between a set of electrodes and generate an impedance profile.

7. The system of claim 6 , wherein the implant control circuitry is configured to update the polarity of an electrode based in part on the impedance profile.

8. The system of claim 7 , wherein the implant circuitry comprises implant communication circuitry configured to wirelessly transmit at least the impedance profile to a non-implantable component.

9. The system of claim 6 , wherein the implant circuitry additionally selectively operates in a diagnostics mode configured to verify power status, electrode status, and communication status.

10. The system of claim 1 , wherein a set of logic inputs from the implant control circuitry is conductively coupled to each electrode of the set of electrodes through an end stage gate system.

11. The system of claim 1 , wherein at least two electrode sites have differing geometry.

12. The system of claim 1 , further comprising of at least one electrode that is electrically coupled to the implant control circuitry as a dedicated anode; and wherein the at least one electrode is positioned at the posterior region of the implant.

13. The system of claim 1 , wherein the configuration of the implant control circuitry to control current flow is further configured to control frequency and duty cycle of the current flow.

14. The system of claim 1 , further comprising: bone growth monitoring circuitry conductively coupled to the set of electrodes, the bone growth monitoring circuitry configured to measure the impedance between a set of electrodes.

15. The system of claim 14 , wherein the plurality of electrodes is conductively coupled to the bone growth monitoring circuitry through a set of multiplexers and demultiplexers, the bone growth monitoring circuitry configured to cycle through a set of impedance checks where the bone growth monitoring circuitry selectively measures impedance between at least two electrodes of the set of electrodes.

16. The system of claim 1 , further comprising: impedance measurement circuitry conductively coupled to the set of electrodes, the bone growth monitoring circuitry configured to measure the impedance between a set of electrodes.

17. A system for electrical stimulation in an orthopedic implant comprising:

at least one implantable component that comprises:

a spinal cage implant body,

a set of at least three electrodes conductively isolated from the implant body and exposed at a set of distinct electrode sites on the implant body,

implant circuitry that comprises circuitry to drive an electrical current implant control circuitry configured to control current flow of the set of electrodes, wherein each of the set of electrodes is conductively coupled to the implant control circuitry and is conductively isolated from each of the remaining electrodes in the set of electrodes, and

wherein at least one electrode is electrically coupled to the implant control circuitry as a dedicated anode; and wherein the at least one electrode is positioned at the posterior region of the implant.

18. The system of claim 17 , wherein the control circuitry is configured to update the polarity of an electrode and magnitude of the electrical current flowing through the electrode in the set of electrodes.

19. The system of claim 18 , wherein the electrode is set as a cathode in a first stimulation mode state of the control circuitry and as an anode in a second stimulation mode state of the control circuitry.

20. The system of claim 17 , wherein the set of electrode sites are exposed on external surfaces of the spinal cage implant body and implant circuitry is integrated within the structure of the spinal cage.

21. The system of claim 17 , wherein the implant body is a substantially flexible surface film structure.

22. The system of claim 17 , wherein the implant control circuitry is additionally configured to selectively operate in an impedance monitoring mode; wherein, when an impedance monitoring mode, the control circuitry is configured to measure the impedance between a set of electrodes and generate an impedance profile.

23. The system of claim 22 , wherein the implant control circuitry is configured to update the polarity of an electrode based in part on the impedance profile.

24. The system of claim 23 , wherein the implant circuitry comprises implant communication circuitry configured to wirelessly transmit at least the impedance profile to a non-implantable component.

25. The system of claim 22 , wherein the implant circuitry additionally selectively operates in a diagnostics mode configured to verify power status, electrode status, and communication status.

26. The system of claim 17 , wherein the conductive coupling to each of the at least three electrodes are individually drivable between at least three states that include anode, cathode, and passive.

27. The system of claim 17 , wherein a set of logic inputs from the implant control circuitry is conductively coupled to each electrode of the set of electrodes through an end stage gate system.

28. The system of claim 17 , wherein at least two electrode sites have differing geometry.

29. The system of claim 17 , wherein the configuration of the implant control circuitry to control current flow is further configured to control frequency and duty cycle of the current flow.

30. The system of claim 17 , further comprising: bone growth monitoring circuitry conductively coupled to the set of electrodes, the bone growth monitoring circuitry configured to measure the impedance between a set of electrodes.

31. The system of claim 30 , wherein the plurality of electrodes is conductively coupled to the bone growth monitoring circuitry through a set of multiplexers and demultiplexers, the bone growth monitoring circuitry configured to cycle through a set of impedance checks where the bone growth monitoring circuitry selectively measures impedance between at least two electrodes of the set of electrodes.

32. The system of claim 17 , further comprising: impedance measurement circuitry conductively coupled to the set of electrodes, the bone growth monitoring circuitry configured to measure the impedance between a set of electrodes.