Semiconductor package and related methods
Implementations of semiconductor packages may include: a prefabricated electrically conductive section; two or more metal oxide semiconductor field effect transistors (MOSFET) physically coupled together; and a back metal coupled to the two or more MOSFETs; wherein the electrically conductive section may be coupled to the back metal and may be configured to electrically couple the two or more MOSFETs together during operation of the two or more MOSFETs.
1. A semiconductor package comprising:
a prefabricated aluminum portion;
two or more metal oxide semiconductor field effect transistors (MOSFET) physically coupled together; and
a back metal coupled to the two or more MOSFETs;
wherein the prefabricated aluminum slab is coupled directly to the back metal and is configured to electrically couple the two or more MOSFETs together during operation of the two or more MOSFETs;
wherein a thickness of the prefabricated aluminum slab portion is between 25 microns to 200 microns.
2. The semiconductor package of claim 1 , wherein the on-resistance of the two or more MOSFETs is reduced through the coupling of the prefabricated aluminum portion to the back metal.
3. The semiconductor package of claim 1 , wherein the prefabricated aluminum portion is not formed as part of the back metal during processing of the wafer.
4. The semiconductor package of claim 1 , wherein the prefabricated aluminum portion is coupled to the back metal using one of a silver sintering paste, solder, electrically conductive epoxy, and any combination thereof.
5. The semiconductor package of claim 1 , wherein the back metal comprises a titanium, nickel, and silver alloy.
6. A semiconductor package comprising:
a prefabricated electrically conductive plate;
two or more metal oxide semiconductor field effect transistors (MOSFET) physically coupled together; and
a back metal coupled to the two or more MOSFETs;
wherein the prefabricated electrically conductive plate is directly coupled to the back metal and is configured to electrically couple the two or more MOSFETs together during operation of the two or more MOSFETs;
wherein a thickness of the prefabricated electrically conductive plate is between 25 microns to 200 microns.
7. The semiconductor package of claim 6 , wherein the on-resistance of the two or more MOSFETs is reduced through the coupling of the prefabricated electrically conductive plate to the back metal.
8. The semiconductor package of claim 6 , wherein the prefabricated electrically conductive plate is not formed as part of the back metal during processing of the wafer.
9. The semiconductor package of claim 6 , wherein the prefabricated electrically conductive plate is coupled to the back metal using one of a silver sintering paste, solder, electrically conductive epoxy, and any combination thereof.