FILM FORMING APPARATUS AND FILM FORMING METHOD
A film forming apparatus includes a reaction vessel that has a film forming target member disposed therein and deposits a film having an element contained in a film forming gas as a constituent element on the film forming target member, utilizing excitation and decomposition of the film forming gas supplied thereto and that has a reaction active region where the film forming gas is capable of being excited and decomposed, and a reaction inactive region that is a region continuous with the reaction active region; a film forming gas supply device that supplies the film forming gas to the reaction inactive region within the reaction vessel; an excitation device that excites and decomposes the film forming gas in the reaction vessel; a holding device that has a holding member which holds the film forming target member, and a drive unit which drives the holding member between the reaction inactive region and the reaction active region and repeatedly moves the film forming target member and which supplies the film forming gas from the reaction inactive region to the reaction active region together with the movement of the film forming target member; and an exhaust member that is provided within the reaction vessel to exhaust a gas in the reaction vessel and that exhausts the gas in the reaction vessel that has passed through or over at least one of an interior or a side face of the film forming target member held by the holding member.
1 . A film forming apparatus comprising:
a reaction vessel that has a film forming target member disposed therein and deposits a film having an element contained in a film forming gas as a constituent element on the film forming target member, utilizing excitation and decomposition of the film forming gas supplied thereto and that has a reaction active region where the film forming gas is capable of being excited and decomposed, and a reaction inactive region that is a region continuous with the reaction active region;
a film forming gas supply device that supplies the film forming gas to the reaction inactive region within the reaction vessel;
an excitation device that excites and decomposes the film forming gas in the reaction vessel;
a holding device that has a holding member which holds the film forming target member, and a drive unit which drives the holding member between the reaction inactive region and the reaction active region and repeatedly moves the film forming target member and which supplies the film forming gas from the reaction inactive region to the reaction active region together with the movement of the film forming target member; and
an exhaust member that is provided within the reaction vessel to exhaust a gas in the reaction vessel and that exhausts the gas in the reaction vessel that has passed through or over at least one of an interior or a side face of the film forming target member held by the holding member.
2 . The film forming apparatus according to claim 1 , further comprising:
a shielding member that is provided within the reaction vessel to shield at least a portion between the reaction active region and the reaction inactive region.
3 . The film forming apparatus according to claim 1 ,
wherein the exhaust member is provided to face a film forming gas supply port of the film forming gas supply device via the film forming target member held by the holding member.
4 . The film forming apparatus according to claim 1 ,
wherein the exhaust member is provided to face the reaction active region within the reaction vessel via the film forming target member held by the holding member.
5 . The film forming apparatus according to claim 1 ,
wherein the holding member is a member that is provided to be interposed between a film forming gas supply port of the film forming gas supply device and the exhaust member and has an opening part through which the gas in the reaction vessel passes.
6 . The film forming apparatus according to claim 1 ,
wherein the holding member is a member that is provided to be interposed between the reaction active region within the reaction vessel and the exhaust member and has an opening part through which the gas in the reaction vessel passes.
7 . The film forming apparatus according to claim 5 ,
wherein the holding member is a tubular member.
8 . The film forming apparatus according to claim 7 ,
wherein the exhaust member is provided on an inner peripheral face side of the tubular member serving as the holding member.
9 . The film forming apparatus according to claim 1 ,
wherein the film forming target member is a member having an opening part through which the gas in the reaction vessel passes.
10 . The film forming apparatus according to claim 9 ,
wherein the film forming target member is a porous body, a tubular member, or a member having through-holes in a thickness direction.
11 . A film forming apparatus comprising:
a reaction vessel that has a film forming target member disposed therein and deposits a film having an element contained in a film forming gas as a constituent element on the film forming target member, utilizing excitation and decomposition of the film forming gas supplied thereto;
a film forming gas supply device that supplies the film forming gas to the reaction vessel;
an excitation device that excites and decomposes the film forming gas in the reaction vessel;
a holding member that is provided within the reaction vessel and holds the film forming target member; and
an exhaust member that is provided within the reaction vessel to exhaust a gas in the reaction vessel and that exhausts the gas in the reaction vessel that has passed through or over at least one of an interior or a side face of the film forming target member held by the holding member.
12 . A film forming method comprising:
supplying a film forming gas to a reaction inactive region within a reaction vessel, the reaction vessel having a film forming target member disposed therein and deposits a film having an element contained in the film forming gas as a constituent element on the film forming target member, utilizing excitation and decomposition of the film forming gas supplied thereto and that has a reaction active region where the film forming gas is capable of being excited and decomposed, and the reaction inactive region that is a region continuous with the reaction active region;
exciting and decomposing the film forming gas in the reaction vessel;
driving a holding member between the reaction inactive region and the reaction active region in a state where the film forming target member is held by the holding member and moving the film forming target member repeatedly and supplying the film forming gas from the reaction inactive region to the reaction active region together with the movement of the film forming target member; and
exhausting a gas in the reaction vessel that has passed through or over at least one of an interior or a side face of the film forming target member held by the holding member.
13 . The film forming method according to claim 12 ,
wherein at least a portion of a boundary between the reaction active region and the reaction inactive region within the reaction vessel is shielded with a shielding member.
14 . The film forming method according to claim 12 ,
wherein the exhaust member is provided to face a film forming gas supply port of the film forming gas supply device via the film forming target member held by the holding member.
15 . The film forming method according to claim 12 ,
wherein the exhaust member is provided to face the reaction active region within the reaction vessel via the film forming target member held by the holding member.
16 . The film forming method according to claim 12 ,
wherein the holding member is a member that is provided to be interposed between a film forming gas supply port of the film forming gas supply device and the exhaust member and has an opening part through which the gas in the reaction vessel passes.
17 . The film forming method according to claim 12 ,
wherein the holding member is a member that is provided to be interposed between the reaction active region within the reaction vessel and the exhaust member and has an opening part through which the gas in the reaction vessel passes.
18 . The film forming method according to claim 16 ,
wherein the holding member is a tubular member.
19 . The film forming method according to claim 18 ,
wherein the exhaust member is provided on an inner peripheral face side of the tubular member serving as the holding member.
20 . The film forming method according to claim 12 ,
wherein the film forming target member is a member having an opening part through which the gas in the reaction vessel passes.
21 . The film forming method according to claim 20 ,
wherein the film forming target member is a porous body, a tubular member, or a member having through-holes in a thickness direction.
22 . A film forming method comprising:
supplying a film forming gas to a reaction vessel, the reaction vessel having a film forming target member disposed therein and deposits a film having an element contained in the film forming gas as a constituent element on the film forming target member, utilizing excitation and decomposition of the film forming gas supplied thereto;
exciting and decomposing the film forming gas in the reaction vessel; and
exhausting a gas in the reaction vessel that has passed through or over at least one of an interior or a side face of the film forming target member held by a holding member.