Etching apparatus and etching method
An etching apparatus includes: a placement table serving as a lower electrode and configured to place a workpiece to be subjected to an etching processing thereon; a DC power supply configured to generate a negative DC voltage applied to the placement table; and a controller configured to: periodically apply a negative DC voltage to the placement table from the DC power supply when the etching processing on the workpiece placed on the placement table is initiated, and decrease a frequency of the negative DC voltage applied to the placement table with an elapse of processing time of the etching processing.
1. An etching apparatus comprising:
a placement table serving as a lower electrode and configured to place a workpiece to be subjected to an etching processing thereon;
a DC power supply configured to generate a negative DC voltage applied to the placement table; and
a controller configured to: periodically apply a negative DC voltage to the placement table from the DC power supply when the etching processing on the workpiece placed on the placement table is initiated; and decrease a frequency of the negative DC voltage applied to the placement table with an elapse of processing time of the etching processing.
2. The etching apparatus according to claim 1 , wherein the controller decreases the frequency of the negative DC voltage applied to the placement table continuously or stepwise with an elapse of processing time of the etching processing.
3. The etching apparatus according to claim 2 , wherein the controller increases or decreases an absolute value of the negative DC voltage applied to the placement table with the elapse of the processing time of the etching processing.
4. The etching apparatus according to claim 3 , wherein the controller calculates a potential difference between the placement table and the workpiece after increasing the absolute value of the negative DC voltage applied to the placement table, and when the potential difference exceeds a predetermined threshold, the controller controls the DC power supply so as to shift a value of the negative DC voltage applied to the placement table by a shift amount for decreasing the potential difference.
5. The etching apparatus according to claim 1 , wherein the controller decreases the frequency of the negative DC voltage applied to the placement table from a first frequency to a second frequency lower than the first frequency at a time point when a predetermined time has elapsed after initiation of the etching processing.
6. The etching apparatus according to claim 1 , wherein the controller increases or decreases an absolute value of the negative DC voltage applied to the placement table with the elapse of the processing time of the etching processing.
7. The etching apparatus according to claim 1 , wherein the controller calculates a potential difference between the placement table and the workpiece after increasing the absolute value of the negative DC voltage applied to the placement table, and when the potential difference exceeds a predetermined threshold, the controller controls the DC power supply so as to shift a value of the negative DC voltage applied to the placement table by a shift amount for decreasing the potential difference.
8. An etching method comprising:
periodically applying a negative DC voltage to a placement table serving as a lower electrode and configured to place a workpiece thereon from a DC power supply configured to generate the negative DC voltage applied to the placement table when an etching processing is initiated on the workpiece placed on the placement table; and
decreasing a frequency of the negative DC voltage applied to the placement table from the DC power supply with an elapse of processing time of the etching processing.