Dual damascene with short liner
A method including forming a dual damascene interconnect structure comprising a metal wire above a via, recessing the metal wire to form a trench, depositing a liner along a bottom and a sidewall of the trench, and forming a new metal wire in the trench. The method may also include forming a dual damascene interconnect structure comprising a metal wire above a via, recessing the metal wire to form a trench, depositing a liner along a bottom and a sidewall of the trench, removing the liner along the bottom of the trench, and forming a new metal wire in the trench.
1. A dual damascene structure comprising:
a first metal wire having an upper portion and a lower portion;
a via below and in electrical contact with the first metal wire;
a seed layer separating the lower portion of the first metal wire from the upper portion of the first metal wire, wherein the seed layer comprises ruthenium,
wherein the upper portion of the first metal wire comprises reflowed copper,
wherein the lower portion of the first metal wire comprises tungsten; and
a second metal wire below and in electrical contact with the via, wherein the second metal wire comprises a homogeneous structure of electroplated copper.
2. The dual damascene structure of claim 1 ,
wherein the via and the lower portion of the first metal wire are a homogenous structure made from the same material.
3. The dual damascene structure of claim 1 ,
wherein the lower portion of the first metal wire is free of voids.
4. The dual damascene structure of claim 1 , further comprising:
a single barrier layer positioned along a bottom and vertical sidewalls of the first metal wire, wherein the lower portion of the first metal wire contacts the single barrier layer, and
wherein the seed layer separates the upper portion of the first metal wire from the single barrier layer,
wherein the single barrier layer and the seed layer each comprise different materials.
5. The dual damascene structure of claim 1 , further comprising:
a first dielectric layer, the first dielectric layer includes the second metal wire; and
a second dielectric layer directly above the first dielectric layer, the second dielectric layer includes the via and the first metal wire.
6. A dual damascene structure comprising:
a first metal wire having an upper portion and a lower portion;
a via below and in electrical contact with the first metal wire;
a seed layer separating the lower portion of the first metal wire from the upper portion of the first metal wire, wherein the seed layer comprises copper only, wherein the upper portion of the first metal wire comprises reflowed copper,
wherein the lower portion of the first metal wire comprises electroplated copper; and
a second metal wire below and in electrical contact with the via, wherein the second metal wire comprises a homogeneous structure of electroplated copper,
wherein an upper most surface of the seed layer is flush with an upper most surface of the upper portion of the first metal wire;
wherein the electroplated copper of the lower portion of the first metal wire comprises a higher level of sulfur and a higher level of chlorine than the reflowered copper of the upper portion of the first metal wire.
7. The dual damascene structure of claim 6 ,
wherein the via and the lower portion of the first metal wire are a homogenous structure made from the same material.
8. The dual damascene structure of claim 6 ,
wherein the lower portion of the first metal wire is free of voids.
9. The dual damascene structure of claim 6 , further comprising:
a single barrier layer positioned along a bottom and vertical sidewalls of the first metal wire, wherein the lower portion of the first metal wire contacts the single barrier layer, and wherein the seed layer separates the upper portion of the first metal wire from the single barrier layer,
wherein the single barrier layer and the seed layer each comprise different materials.
10. The dual damascene structure of claim 6 , further comprising:
a first dielectric layer, the first dielectric layer includes the second metal wire; and
a second dielectric layer directly above the first dielectric layer, the second dielectric layer includes the via and the first metal wire.
11. A dual damascene structure comprising:
a first metal wire having an upper portion and a lower portion, the lower portion is entirely below the upper portion;
a via below and in electrical contact with the first metal wire;
a seed layer separating the lower portion of the first metal wire from the upper portion of the first metal wire, wherein the seed layer comprises copper only, wherein the upper portion of the first metal wire comprises reflowed copper,
wherein the lower portion of the first metal wire comprises electroplated copper;
a single barrier layer positioned along a bottom and vertical sidewalls of the first metal wire, wherein the lower portion of the first metal wire contacts the single barrier layer, and wherein the seed layer separates the upper portion of the first metal wire from the single barrier layer,
wherein the single barrier layer and the seed layer each comprise different materials,
wherein sidewalls of the seed layer directly contact sidewalls of the single barrier layer; and
a second metal wire below and in electrical contact with the via, wherein the second metal wire comprises a homogeneous structure of electroplated copper.
12. The dual damascene structure of claim 11 ,
wherein the via and the lower portion of the first metal wire are a homogenous structure made from the same material.
13. The dual damascene structure of claim 11 ,
wherein the lower portion of the first metal wire is free of voids.
14. The dual damascene structure of claim 11 ,
wherein an upper most surface of the seed layer is flush with an upper most surface of the upper portion of the first metal wire,
wherein the seed layer surrounds all vertical sides and a bottom of the upper portion of the first metal wire.