IP Library Granted Patent US 10,954,439
Granted Patent B2
US 10,954,439 · App. 16/407,939 · Granted Mar 23, 2021

Semiconductor nanoparticles, method of producing the semiconductor nanoparticles, and light-emitting device

Inventors: Tsukasa Torimoto (Nagoya, JP); Tatsuya Kameyama (Nagoya, JP); Hiroki Yamauchi (Nagoya, JP); Chie Miyamae (Nagoya, JP); Yuki Mori (Nagoya, JP); Susumu Kuwabata (Ibaraki, JP); Taro Uematsu (Suita, JP); Daisuke Oyamatsu (Tokushima, JP)
Assignees: NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION and RESEARCH SYSTEM; OSAKA UNIVERSITY; NICHIA CORPORATION
C09K11/881F21K9/64H01L33/502B82Y30/00B82Y40/00F21Y2115/10H01L2933/0041
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Quick Facts
Patent No.
US 10,954,439
App. No.
16/407,939
Granted
Mar 23, 2021
Kind
B2
Abstract

A method of producing semiconductor nanoparticles, semiconductor nanoparticles, and a light-emitting device are provided. The method includes heat-treating a mixture containing a salt of Ag, a salt containing at least one of In and Ga, an Se supply source, and an organic solvent at a temperature in the range of above 200° C. to 370° C. In the method, the ratio of the number of Ag atoms to the total number of In and Ga atoms in the mixture is above 0.43 to 2.5. The semiconductor nanoparticles contains Ag, at least one of In and Ga, and Se. The light-emitting device includes a light conversion member containing the semiconductor nanoparticles and a semiconductor light-emitting element.

Claims (12)

1. A method of producing semiconductor nanoparticles, the method comprising:

heat-treating a mixture containing a salt of Ag, a salt containing at least one of In and Ga, an Se supply source, and an organic solvent at a temperature in a range of above 200° C. to 370° C. to obtain the semiconductor nanoparticles,

wherein

a ratio of a number of Ag atoms to a total number of In and Ga atoms in the mixture is above 0.43 to 2.5, and

wherein the method further comprises pre-heating the mixture at a temperature in a range of 30° C. to 190° C. for 1 min to 15 min before heat-treating the mixture at a temperature in the range of above 200° C. to 370° C.

2. The method of producing semiconductor nanoparticles according to claim 1 , wherein

the mixture further contains a salt of an alkali metal, and

a ratio of a number of atoms of the alkali metal to a total number of atoms of the alkali metal and Ag in the mixture is 0.85 or less.

3. The method of producing semiconductor nanoparticles according to claim 2 , wherein

the mixture further contains an S supply source, and a ratio of a number of S atoms to a total number of Se atoms and S atoms in the mixture is 0.95 or less.

4. The method of producing semiconductor nanoparticles according to claim 1 , wherein

the mixture further contains an S supply source, and a ratio of a number of S atoms to a total number of Se atoms and S atoms in the mixture is 0.95 or less.

Assignments (2)
CHANGE OF NAME Recorded Feb 2, 2021
From: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
To: NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM
Reel/Frame 055204/0869 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2019
From: TORIMOTO, TSUKASA; KAMEYAMA, TATSUYA; YAMAUCHI, HIROKI; MIYAMAE, CHIE; MORI, YUKI; OYAMATSU, DAISUKE; KUWABATA, SUSUMU; UEMATSU, TARO
To: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY; OSAKA UNIVERSITY; NICHIA CORPORATION
Reel/Frame 049625/0068 →
Priority Claims (3)
JP JP2018-091556 · May 10, 2018 · national
JP JP2018-156357 · Aug 23, 2018 · national
JP JP2018-211131 · Nov 9, 2018 · national
Continuity (1)
Related Publication 20190345384A1 · Nov 14, 2019