IP Library Granted Patent US 10,533,982
Granted Patent B2
US 10,533,982 · App. 16/412,996 · Granted Jan 14, 2020

Mass flow controller and method for controlling a mass flow rate of a gas in a gas stream

Inventors: Patrick Albright (Wellington, CO); Ryan Johnson (Fort Collins, CO); Alexei V. Smirnov (Fort Collins, CO)
Assignee: HITACHI METALS, LTD.
G01N33/0073G01F1/6842G01F1/69G01F1/696G01F1/76G01F15/005G01N25/00
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Quick Facts
Patent No.
US 10,533,982
App. No.
16/412,996
Granted
Jan 14, 2020
Kind
B2
Abstract

Systems and method for detecting a concentration of a gas in a gas stream are disclosed. A method includes receiving a gas stream including a carrier gas and a processing gas. Bridge signals of a mass flow sensor are used to produce a processing-gas concentration signal and a gas-stream mass flow rate signal. The gas stream is controlled so a mass flow rate of the processing gas equals a processing-gas-setpoint signal. In some variations, the processing-gas-concentration signal is produced using an upstream temperature of the gas stream and a bridge-derived temperature.

Claims (40)

1. A mass flow controller comprising:

a main flow path for a gas stream, the gas stream including a processing gas and a carrier gas;

a temperature sensor disposed and configured to obtain an upstream temperature of the gas stream and provide an upstream temperature signal indicative of the upstream temperature;

a thermal mass flow sensor coupled to the main flow path, wherein the thermal mass flow sensor is configured to provide a bridge-derived temperature signal indicative of a bridge-derived temperature and a gas-stream-flow-rate signal indicative of a mass flow rate of the gas stream;

a gas concentration meter disposed to receive the bridge-derived temperature signal, and the gas concentration meter is configured to provide a processing-gas-concentration signal based upon the bridge-derived temperature signal;

a processing-gas mass flow meter disposed to receive the processing-gas-concentration signal and the gas-stream-flow-rate signal, wherein the processing-gas mass flow meter is configured to provide a processing-gas-mass-flow-rate signal;

a control valve coupled to the conduit to control a mass flow rate of the gas stream; and

a controller disposed to receive the processing-gas-mass-flow-rate signal and adjust the control valve so the processing-gas-mass flow rate equals a processing-gas-setpoint signal.

2. The mass flow controller of claim 1 , wherein the thermal mass flow sensor includes:

a sensor tube coupled to the main flow path;

at least two sensing elements coupled to the sensor tube, wherein the at least two sensor elements are arranged in a bridge circuit;

a bridge-derived temperature module configured generate the bridge-derived temperature signal; and

a differential-voltage processing module configured to produce the gas-stream-flow-rate signal based upon a differential voltage of the bridge circuit.

3. The mass flow controller of claim 1 , wherein the gas concentration meter is configured to:

obtain a temperature-difference between the upstream temperature of the gas stream and the bridge-derived temperature; and

utilize the temperature-difference to lookup a concentration value for the processing gas.

4. The mass flow controller of claim 1 , wherein the gas concentration meter is configured to:

obtain the temperature-difference between the upstream temperature of the gas stream and the bridge-derived temperature; and

utilize the temperature-difference to calculate the concentration value for the processing gas.

5. A mass flow control system comprising:

a conduit to receive a gas stream including a carrier gas and a processing gas;

a thermal mass flow sensor disposed to receive the gas stream from the conduit, wherein the thermal mass flow sensor is configured to provide a bridge-derived temperature signal indicative of a bridge-derived temperature and a gas-stream-flow-rate signal;

a gas concentration meter disposed to receive the bridge-derived temperature signal and the gas-stream-flow-rate signal, and the gas concentration meter is configured to provide a processing-gas-concentration signal based upon the bridge-derived temperature signal and a gas-stream-flow-rate signal;

a processing-gas mass flow meter disposed to receive the processing-gas-concentration signal and the gas-stream-flow-rate signal, wherein the processing-gas mass flow meter is configured to provide a processing-gas-mass-flow-rate signal;

a control valve coupled to the conduit to control a mass flow rate of the gas stream; and

a controller disposed to receive the processing-gas-mass-flow-rate signal and adjust the control valve so the processing-gas-mass flow rate equals a processing-gas-setpoint signal.

6. The mass flow control system of claim 5 , wherein the thermal mass flow sensor includes:

a sensor tube coupled to the conduit;

at least two sensing elements coupled to the sensor tube, wherein the at least two sensor elements are arranged in a bridge circuit;

a top voltage processing module configured generate the bridge-derived temperature signal using a top voltage of the bridge;

a differential-voltage processing module configured to produce the gas-stream-flow-rate signal based upon a differential voltage of the bridge circuit.

7. The mass flow control system of claim 5 , including:

a vaporizer including:

an input to receive the carrier gas;

a chamber to produce the processing-gas from a material source; and

an output coupled to the conduit to provide the gas stream.

8. The mass flow control system of claim 5 , wherein the gas concentration meter is configured to:

utilize the bridge-derived temperature signal and the gas-stream-flow-rate signal to lookup a concentration value for the processing gas.

9. The mass flow control system of claim 5 , wherein the gas concentration meter is configured to:

utilize the bridge-derived temperature signal and the gas-stream-flow-rate signal to calculate the concentration value for the processing gas.

Assignments (3)
CHANGE OF ADDRESS Recorded Sep 11, 2024
From: HITACHI METALS, LTD.
To: HITACHI METALS, LTD.
Reel/Frame 068944/0403 →
CHANGE OF NAME Recorded Sep 11, 2024
From: HITACHI METALS, LTD.
To: PROTERIAL, LTD.
Reel/Frame 068944/0827 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2019
From: ALBRIGHT, PATRICK; JOHNSON, RYAN; SMIRNOV, ALEXEI
To: HITACHI METALS LTD.
Reel/Frame 049187/0214 →
Continuity (3)
Continuation 15378810 · Dec 14, 2016
Provisional Application 62266832 · Dec 14, 2015
Related Publication 20190265218A1 · Aug 29, 2019