IP Library Granted Patent US 10,950,409
Granted Patent B2
US 10,950,409 · App. 16/416,423 · Granted Mar 16, 2021

High reliability, long lifetime, negative ion source

Inventors: Joseph D. Sherman (Santa Fe, NM); Evan R. Sengbusch (Verona, WI); Ross F. Radel (Madison, WI); Arne V. Kobernik (Madison, WI); Tye T. Gribb (Fitchburg, WI); Preston J. Barrows (Madison, WI); Christopher M. Seyfert (Ridgeway, WI); Logan D. Campbell (Madison, WI); Daniel J. Swanson (Madison, WI); Eric D. Risley (Middleton, WI); Jin W. Lee (Madison, WI); Kevin D. Meaney (Green Bay, WI)
Assignee: PHOENIX LLC
H01J27/028H01J27/024H01J27/16H01J27/18H01J27/22H01J37/08H05H1/30H05H3/00
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,950,409
App. No.
16/416,423
Granted
Mar 16, 2021
Kind
B2
Abstract

A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

Claims (29)

1. A negative ion source comprising:

a plasma chamber containing a gas to be ionized;

a microwave source configured to transmit microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms;

a negative ion source converter configured to convert the hyperthermal neutral atoms to negative ions; and

a magnetic filter configured to reduce the temperature of electrons between the plasma chamber and the negative ion source converter.

2. The negative ion source of claim 1 , wherein the plasma chamber has a high voltage and the microwave source is at ground potential.

3. The negative ion source of claim 1 , further comprising a waveguide configured to electrically isolate the plasma chamber and the microwave source, the waveguide comprising a flange configured to allow a break in the waveguide to be insulated with air.

4. The negative ion source of claim 3 , wherein a plurality of waveguides are used to electrically isolate the plasma chamber and the microwave source.

5. The negative ion source of claim 1 , wherein the gas to be ionized is hydrogen and the hyperthermal neutral atoms produced are hyperthermal neutral hydrogen atoms.

6. The negative ion source of claim 1 , wherein the microwave source comprises a 2.45 GHz microwave source.

7. The negative ion source of claim 1 , wherein the negative ion source converter comprises a cone-shaped cesiated surface.

8. The negative ion source of claim 1 , wherein the magnetic filter comprises a tunable magnetic dipole field provided circumferentially around a junction between the plasma chamber the negative ion converter.

9. A negative ion source comprising:

a plasma chamber containing gas to be ionized;

a microwave source configured to transmit microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms;

a negative ion converter configured to convert the hyperthermal neutral atoms to negative ions; and

a magnetic filter configured to reduce a temperature of an electron density provided between the plasma chamber and the negative ion converter.

10. The negative ion source of claim 9 , wherein the plasma chamber has a high voltage and the microwave source is at ground potential.

11. The negative ion source of claim 9 , further comprising a waveguide configured to electrically isolate the plasma chamber and the microwave source, the waveguide comprising a flange configured to allow a break in the waveguide to be insulated with air.

12. The negative ion source of claim 11 , wherein a plurality of waveguides are used to electrically isolate the plasma chamber and the microwave source.

13. The negative ion source of claim 9 , wherein the microwave source comprises a 2.45 GHz microwave source.

14. The negative ion source of claim 9 , wherein the negative ion converter comprises a cone-shaped cesiated surface.

15. The negative ion source of claim 9 , wherein the magnetic filter comprises a tunable magnetic dipole field provided circumferentially around a junction between the plasma chamber and the negative ion converter.

16. A method of producing negative ions, the method comprising:

providing a gas to be ionized in a plasma chamber;

transmitting microwaves from a microwave source to the plasma chamber to ionize the gas such that hyperthermal neutral atoms of the gas are produced; and

converting the hyperthermal neutral atoms to negative ions via an interaction with a negative ion source converter.

17. The method of claim 16 , further comprising reducing a temperature of an electron density provided between the plasma chamber and the negative ion source converter with a magnetic filter.

18. The method of claim 16 , further comprising electrically isolating the plasma chamber and the microwave source with a waveguide comprising a flange configured to allow a break in the waveguide to be insulated with air.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 16, 2022
From: PHOENIX, LLC
To: SHINE TECHNOLOGIES, LLC
Reel/Frame 061123/0867 →
CHANGE OF NAME Recorded Oct 15, 2021
From: SHINE MEDICAL TECHNOLOGIES, LLC
To: SHINE TECHNOLOGIES, LLC
Reel/Frame 057827/0923 →
SECURITY INTEREST Recorded May 4, 2021
From: PHOENIX LLC; PHOENIX NEUTRON IMAGING LLC
To: DEERFIELD MANAGEMENT COMPANY, L.P.
Reel/Frame 056123/0334 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2019
From: PHOENIX NUCLEAR LABS LLC
To: PHOENIX LLC
Reel/Frame 049374/0453 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 31, 2019
From: SHERMAN, JOSEPH D.; SENGBUSCH, EVAN R.; RADEL, ROSS F.; KOBERNIK, ARNE V.; GRIBB, TYE T.; BARROWS, PRESTON J.; SEYFERT, CHRISTOPHER M.; CAMPBELL, LOGAN D.; SWANSON, DANIEL J.; RISLEY, ERIC D.; LEE, JIN W.; MEANEY, KEVIN D.
To: PHOENIX NUCLEAR LABS LLC
Reel/Frame 049328/0141 →
Continuity (4)
Continuation 15846752 · Dec 19, 2017
Continuation 14903747
Provisional Application 61844054 · Jul 9, 2013
Related Publication 20190279835A1 · Sep 12, 2019