Beam scanning device and system including the same comprising a phase mask having a plurality of nanostructures to control the phase of light from a spatial light modulator

1. A beam scanning device comprising:

a spatial light modulator configured to modulate a phase of a light for a corresponding pixel of a plurality of pixels; and

a phase mask comprising a support plate arranged in an output direction of the light that is output from the spatial light modulator and a plurality of nanostructures arranged on the support plate differently for each of the plurality of pixels to control the phase of the light.

2. The beam scanning device of claim 1 , wherein the spatial light modulator comprises a first reflector, a second reflector, and a cavity provided between the first reflector and the second reflector.

3. The beam scanning device of claim 2 , wherein each of the first reflector and the second reflector comprises a distributed Bragg reflector or a grating reflector.

4. The beam scanning device of claim 1 , wherein the spatial light modulator is driven independently for each of the plurality of pixels by an input of at least one of voltage, current, heat, and magnetic field.

5. The beam scanning device of claim 1 , wherein the support plate comprises a transparent plate.

6. The beam scanning device of claim 1 , wherein the plurality of nanostructures comprises a dielectric having a refractive index of about 1.9 to about 4.

7. The beam scanning device of claim 1 , wherein the plurality of nanostructures comprises at least one selected from the group consisting of Si, Ge, SiGe, GaAs, Si 3 N 4 , TiO 2 , GaP, and InSb.

8. The beam scanning device of claim 1 , wherein the plurality of nanostructures have a column shape.

9. The beam scanning device of claim 1 , wherein the plurality of nanostructures of the phase mask have at least one of a cylinder shape, a polygonal column shape, and a cross column shape.

10. The beam scanning device of claim 1 , wherein the plurality of nanostructures are configured differently for each of the plurality of pixels in terms of at least one of a nanostructure size, a number of nanostructures, a nanostructure shape, and an arrangement interval of nanostructures.

11. The beam scanning device of claim 1 , wherein an arrangement interval of the plurality of nanostructures is in a range of λ/2n to 5λ/2n, where a wavelength of light used in the beam scanning device is λ and a refractive index of a nanostructure is n.

12. The beam scanning device of claim 1 , wherein a height of the plurality of nanostructures is in a range of 3λ/2n to 7λ/2n, where a wavelength of the light incident onto the beam scanning device is λ and a refractive index of the plurality of nanostructures is n.

13. The beam scanning device of claim 1 , further comprising a spacer provided between the spatial light modulator and the phase mask.

14. A system comprising:

a light source configured to radiate a light;

a beam scanning device configured to scan an object by adjusting a travel direction of the light that is output from the light source, the beam scanning device comprising:

a spatial light modulator configured to modulate a phase of the light for a corresponding pixel of a plurality of pixels, and

a phase mask comprising a support plate arranged in an output direction of the light that is output from the spatial light modulator and a plurality of nanostructures arranged on the support plate differently for each of the plurality of pixels to control the phase of the light; and

a light detector configured to detect the light that is reflected from the object.

15. The system of claim 14 , wherein the spatial light modulator comprises a first reflector, a second reflector, and a cavity portion provided between the first reflector and the second reflector.

16. The system of claim 15 , wherein each of the first reflector and the second reflector comprises a distributed Bragg reflector or a grating reflector.

17. The system of claim 14 , wherein the spatial light modulator is driven independently for each of the plurality of pixels by an input of at least one of voltage, current, heat, and magnetic field.

18. The system of claim 14 , wherein the plurality of nanostructures comprise a dielectric having a refractive index of about 1.9 to about 4.

19. The system of claim 14 , wherein the plurality of nanostructures include at least one selected from the group consisting of Si, Ge, SiGe, GaAs, Si 3 N 4 , TiO 2 , GaP, and InSb.

20. The system of claim 14 , wherein the plurality of nanostructures of the phase mask include at least one of a cylinder, a polygonal column, and a cross column.

21. The system of claim 14 , wherein the plurality of nanostructures are configured differently for each pixel in terms of at least one of a nanostructure size, a number of nanostructures, a nanostructure shape, and an arrangement interval of nanostructures.

22. The system of claim 14 , wherein an arrangement interval of the plurality of nanostructures is in a range of λ/2n to 5λ/2n, where a wavelength of the light is λ and a refractive index of a nanostructure is n.

23. The system of claim 14 , wherein a height of the plurality of nanostructures is in a range of 3λ/2n to 7λ/2n, where a wavelength of the light is λ and a refractive index of a nanostructure is n.

24. The system of claim 14 , wherein the beam scanning device further comprises a spacer between the spatial light modulator and the phase mask.

25. A beam scanning device comprising:

a plurality of pixels,

wherein each of the plurality of pixels comprises:

a spatial light modulator configured to modulate a phase of a light based on a voltage applied to the spatial light modulator; and

a phase mask comprising a plurality of differently-shaped nanostructures configured to deflect the light incident onto the plurality of nanostructures from the spatial light modulator, and

wherein the plurality of pixels have different nanostructure arrays from each other.