Method for producing a system including a first microelectromechanical element and a second microelectromechanical element, and a system

1. A method for producing a system, the system including a first microelectromechanical element and a second microelectromechanical element, the method comprising:

providing, in a first task, a substrate having the first microelectromechanical element and the second microelectromechanical element, and a cap element, a getter material being situated on the substrate in a first region in a surrounding environment of the first microelectromechanical element and/or on the cap element in a first corresponding region;

situating, in a second task, following the first task, the cap element on the substrate using a wafer bonding technique so that a sealed first chamber is formed that contains the first microelectromechanical element as well as the first region and/or the first corresponding region, a sealed second chamber additionally being formed that contains the second microelectromechanical element, wherein the wafer bonding technique is carried out at a pressure that is below an ideal pressure for operation of the second microelectromechanical element;

producing, in a third task, following the second task, an opening in the second chamber; and

sealing, in a fourth task, following the third task, the opening in the second chamber at a first ambient pressure, in particular a first gas pressure, where an internal pressure of the second microelectromechanical element is not set until the fourth task through a selection of the first ambient pressure when the opening in the second chamber is sealed.

2. The method of claim 1 , wherein the first microelectromechanical element includes a rotational rate sensor, and the second microelectromechanical element includes an acceleration sensor.

3. The method of claim 1 , wherein the wafer bonding technique includes a metallic bonding process.

4. The method of claim 1 , wherein a second ambient pressure, in particular a second gas pressure, prevailing during the formation of the first and second chambers during the second task.

5. The method of claim 1 , wherein the first ambient pressure is between 50 and 1000 mbar.

6. The method of claim 1 , wherein the opening is formed in the third task using a trench method or a laser drilling process.

7. The method of claim 1 , wherein the opening is produced in the third task in the substrate or in the cap element.

8. The method of claim 1 , wherein the opening is sealed in the fourth task using a laser seal or using a layer deposition process.

9. The method of claim 1 , wherein, in the first task, the getter material and/or a further getter material is additionally situated on the substrate in a second region in a surrounding environment of the second microelectromechanical element and/or on the cap element in a second corresponding region, the second chamber formed in the second task additionally containing the second region and/or the second corresponding region.

10. The method of claim 1 , wherein the cap element includes a CMOS wafer element.

11. The method of claim 1 , wherein the first ambient pressure is between 50 and 1000 mbar, the fourth task being carried out in a defined gas atmosphere, in particular having nitrogen and/or at least one noble gas.

12. The method of claim 1 , wherein the wafer bonding technique includes an aluminum-germanium bonding process.