Plasma-based electro-optical sensing and methods

1. A plasma sensor, comprising:

a first electrode configured to generate pulsed plasma based on an input voltage and a current so that the pulsed plasma interacts with a particle and atomizes the particle when the pulsed plasma is disposed in a flow field;

embedded fiber optics disposed on either side of the first electrode configured for presence detection, atomic species element identification and quantification of the atomized particle;

a second electrode configured to generate DC plasma having an electrical field based on an input DC voltage and a DC current, the second electrode configured to dispose the DC plasma in a flow field;

a probe configured to detect a change in the electrical field; and

a power control unit configured to supply the input DC voltage and the DC current to the second electrode,

wherein the probe is in electrical communication with a processor configured to identify particle size based on the change in the electrical field.

2. The plasma sensor of claim 1 , wherein the first electrode is further configured to generate DC plasma having an electrical field based on an input DC voltage and a DC current, the first electrode configured to dispose the DC plasma in the flow field.

3. The plasma sensor of claim 1 , wherein the probe includes a Langmuir probe.

4. The plasma sensor of claim 1 , wherein the second electrode and the probe are encapsulated in a cap, the cap configured to confine the DC plasma.

5. The plasma sensor of claim 4 , wherein the cap includes ceramic.

6. The plasma sensor of claim 1 , wherein, the plasma sensor further includes a conductive, porous cap disposed over the second electrode and the probe, the cap configured to confine the DC plasma.

7. A plasma-based sensing system, the plasma-based sensing system comprising:

a plasma sensor including:

a first electrode configured to generate pulsed plasma based on an input voltage and a current so that the pulsed plasma interacts with a particle and atomizes the particle when the pulsed plasma is disposed in a flow field; and

a second electrode configured to generate DC plasma having an electrical field based on an input DC voltage and a DC current, the second electrode configured to dispose the DC plasma in the flow field;

an optical probe configured for presence detection, atomic species element identification and quantification of the atomized particle;

a second probe configured to detect a change in the electrical field;

a first power control unit configured to supply the input voltage and the current to the first electrode;

a second power control unit configured to supply the input DC voltage and the DC current to the second electrode; and

a processor in electrical communication with the optical probe and configured to identify an atomic emission of the pulsed plasma,

wherein the processor is in electrical communication with the second probe and configured to identify particle size based on the change in the electrical field.

8. The plasma-based sensing system of claim 7 , wherein the processor is further configured to determine particle composition based on the identified atomic emission.

9. The plasma-based sensing system of claim 7 , wherein the first electrode is further configured to generate DC plasma having an electrical field based on an input DC voltage and a DC current, the first electrode configured to dispose the DC plasma in the flow field.

10. The plasma-based sensing system of claim 7 , further including a user interface configured to enable user control of DC plasma properties.

11. The plasma-based sensing system of claim 7 , further including a user interface configured to enable user control of pulsed plasma properties.

12. The plasma-based sensing system of claim 7 , further including a display to display the identified particle size.

13. The plasma-based sensing system of claim 7 , wherein the processor is further configured to determine a fluid dynamic based on the input DC voltage and the DC current.

14. The plasma-based sensing system of claim 7 , wherein the processor is further configured to:

determine a plasma property including sheath potential (φpl(t)), electron number density (ne), floating potential (φf(t)), or combinations thereof; and

determine a change in a local pressure dynamic field based on the plasma property.

15. The plasma-based sensing system of claim 7 , wherein the second probe includes a Langmuir probe.

16. A method for element identification and quantification, the method comprising:

generating, by a first electrode, pulsed plasma based on an input voltage and a current so that the pulsed plasma interacts with a particle and atomizes the particle when the pulsed plasma is disposed in a flow field;

identifying an atomic emission of the pulsed plasma with an optical sensor;

determining element identification and quantification based on the identified emission of the atomized particle;

generating, by a second electrode, DC plasma having an electrical field based on an input DC voltage and a DC current;

positioning the DC plasma in the flow field;

detecting a change in the electrical field of the DC plasma, by a probe;

determining a size of the particle based on the change in the electrical field; and

supplying the input DC voltage and the DC current to the second electrode, by a power control unit,

wherein the particle size is identified based on the change in the electrical field, by a processor in electrical communication with the probe.

17. The method of claim 16 , further including determining particle composition based on the identified atomic emission.

18. The method of claim 16 , further including determining a fluid dynamic based on the input DC voltage and the DC current.

19. The method of claim 16 , further including displaying on a display at least one of the determined particle size or composition.