Ion beam device
In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.
1. An ion beam apparatus comprising:
a vacuum chamber;
a gas field ion source that is installed in the vacuum chamber and has an emitter tip;
an extraction electrode that is disposed to face the emitter tip;
a gas supply means for supplying a gas to the emitter tip;
a focusing lens that focuses an ion beam emitted from the emitter tip;
a deflector that deflects the ion beam that has passed through the focusing lens; and
a secondary particle detector that irradiates a sample with the ion beam to detect secondary particles emitted from the sample,
wherein the gas supply means includes a mixed gas chamber containing two or more types of gases including at least a hydrogen gas and a neon gas, a pipe that connects the mixed gas chamber and the vacuum chamber for supplying a mixed gas of a hydrogen gas and a neon gas, and a pipe that connects the mixed gas chamber and the vacuum chamber for supplying a hydrogen gas that has passed through a hydrogen selective transmission membrane.
2. The ion beam apparatus according to claim 1 , wherein the gas supply means includes a controller configured to control a temperature of the hydrogen selective transmission membrane.
3. The ion beam apparatus according to claim 1 , further comprising:
a controller configured to store at least two ion extraction voltages.
4. The ion beam apparatus according to claim 1 , further comprising:
a heater arranged adjacent to the hydrogen selective transmission membrane and configured to heat the hydrogen selective transmission membrane.
5. The ion beam apparatus according to claim 2 , further comprising:
a controller configured to store at least two ion extraction voltages.
6. An ion beam apparatus comprising:
a vacuum chamber;
a gas field ion source that is installed in the vacuum chamber and has an emitter tip;
an extraction electrode that is disposed to face the emitter tip;
a gas supply means for supplying a gas to the emitter tip;
a focusing lens that focuses an ion beam emitted from the emitter tip;
a deflector that deflects the ion beam that has passed through the focusing lens; and
a secondary particle detector that irradiates a sample with the ion beam to detect secondary particles emitted from the sample,
wherein the gas supply means includes a mixed gas chamber containing two or more types of gases including at least a hydrogen gas and a nitrogen gas, a pipe that connects the mixed gas chamber and the vacuum chamber for supplying a mixed gas of a hydrogen gas and a nitrogen gas, and a pipe that connects the mixed gas chamber and the vacuum chamber for supplying a hydrogen gas that has passed through a hydrogen selective transmission membrane.
7. The ion beam apparatus according to claim 6 , wherein the gas supply means includes a controller configured to control a temperature of the hydrogen selective transmission membrane.
8. The ion beam apparatus according to claim 6 , further comprising:
a controller configured to store at least two ion extraction voltages.
9. The ion beam apparatus according to claim 6 , further comprising:
a heater arranged adjacent to the hydrogen selective transmission membrane and configured to heat the hydrogen selective transmission membrane.
10. An ion beam apparatus comprising:
a vacuum chamber;
a gas field ion source that is installed in the vacuum chamber and has an emitter tip;
an extraction electrode that is disposed to face the emitter tip;
a gas supply means for supplying a gas to the emitter tip;
a focusing lens that focuses an ion beam emitted from the emitter tip;
a deflector that deflects the ion beam that has passed through the focusing lens; and
a secondary particle detector that irradiates a sample with the ion beam to detect secondary particles emitted from the sample,
wherein the gas supply means supplies a hydrogen gas, and a neon gas or a nitrogen gas, to the emitter tip, and the vacuum chamber in which the emitter tip is installed has at least two non-evaporable getter pumps using different non-evaporable getter materials, and
wherein at least two evacuation pumps are connected to the vacuum chamber in which the emitter tip is installed, a vacuum valve is provided between each of the evacuation pumps and the vacuum chamber, the evacuation pumps each have a getter material, wherein a first evacuation pump contains a first getter material having a rate of adsorbing the hydrogen gas which is higher than a rate of adsorbing the inert gas by one digit or more, and a second evacuation pump contains a second getter material having a rate of adsorbing the hydrogen gas which is lower than the rate of adsorbing the inert gas by one digit or more.