Method for preparing a p-type semiconductor layer, enhanced device and method for manufacturing the same
A method for preparing a p-type semiconductor layer, an enhanced device and a method for manufacturing the same disclosed relate to the technical field of microelectronics. The method for preparing a p-type semiconductor layer includes: preparing a p-type semiconductor layer; preparing a protective layer on the p-type semiconductor layer, in which the protective layer is made of AlN or AlGaN; and annealing the p-type semiconductor layer under protection of the protective layer. In this way, the protective layer can protect the p-type semiconductor layer from volatilization and to form high-quality surface morphology in the subsequent high-temperature annealing treatment of the p-type semiconductor layer.
1. An enhanced device, comprising:
a substrate;
a channel layer disposed on the substrate;
a barrier layer disposed on the channel layer;
a p-type semiconductor layer disposed on the channel layer;
and a protective layer disposed on the p-type semiconductor layer, wherein the protective layer is made of AlN or AlGaN; and
a thin film layer disposed between the barrier layer and the p-type semiconductor layer, wherein the thin film layer is an insulating layer or an n-type semiconductor layer.
2. The enhanced device of claim 1 , wherein the p-type semiconductor layer comprises anyone or any combination of p-type GaN, p-type InGaN and p-type AlInGaN.
3. The enhanced device of claim 1 , wherein the p-type semiconductor layer is doped with Mg.
4. A method for manufacturing the enhanced device, comprising the following steps:
forming a channel layer on a substrate;
forming a barrier layer on the channel layer;
forming a p-type semiconductor layer on the barrier layer;
forming a protective layer on the p-type semiconductor layer, wherein the protective layer is made of AlN or AlGaN;
and annealing the p-type semiconductor layer under protection of the protective layer;
wherein before the forming a p-type semiconductor layer on the barrier layer, a thin film layer is formed on the barrier layer, wherein the thin film layer is an insulating layer or an n-type semiconductor layer.
5. The method of claims 4 , wherein the p-type semiconductor layer comprises anyone or any combination of p-type GaN, p-type InGaN and p-type AlInGaN.
6. The method of claim 4 , wherein the p-type semiconductor layer is doped with Mg.
7. The method of claim 4 , wherein preparation temperature of the protective layer is not higher than preparation temperature of the p-type semiconductor layer.