Resist composition and method of forming resist pattern
A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra 00 represents an acid dissociable group; R 101 , R 104 and R 106 each independently represents a hydrocarbon group containing an aromatic ring; R 105 , R 107 and R 108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R 102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M′ m+ represents an m-valent onium cation.
1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base component (A) which exhibits changed solubility m a developing solution under action of acid, and
an acid generator component (B) which generates acid upon exposure,
the base component (A) comprising a resin component (A1) comprising a structural unit (a0) represented by general formula (a0) shown below, and
the acid generator component (B) comprising at least one member selected from the group consisting of a compound (b-1) represented by general formula (b-1) shown below, a compound (b-2) represented by general formula (b-2) shown below and a compound (b-3) represented by general formula (b-3) shown below:
wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa is a divalent aromatic hydrocarbon group represented by the formula:
wherein *1 represents a bonding site to which Va x0 is bonded, and *2 represents a bonding site to which —C(═O)—O (-Va 0 -C(═O)—O— na0 -Ra 00 is bonded, provided that a hydrogen atom bonded to the benzene ring in the divalent aromatic hydrocarbon group represented by the above formula may be substituted with a substituent; Va 0 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; and Ra 00 is a group represented by general formula (a1-r2-1) shown below, a group represented by general formula (a1-r2-2) shown below, a group represented by general formula (a1-r2-3) shown below or a group represented by general formula (a1-r2-4) shown below:
wherein Ra′ 10 represents an alkyl group having 1 to 10 carbon atoms; Ra′ 11 is a group which forms an aliphatic cyclic group together with a carbon atom having Ra′ 10 bonded thereto, or a fused cyclic group in which an aromatic ring is fused with the alicyclic group; Ya represents a carbon atom; Xa represents a group which forms a monocyclic aliphatic hydrocarbon group together with Ya, provided that part or all of the hydrogen atoms of the monocyclic aliphatic hydrocarbon group may be substituted; Ra 01 to Ra 03 each independently represents a hydrogen atom, a monovalent saturated chain hydrocarbon group of 1 to 10 carbon atoms or a monovalent saturated aliphatic cyclic hydrocarbon group of 3 to 20 carbon atoms, provided that part or all of the hydrogen atoms of the saturated chain hydrocarbon or the saturated aliphatic cyclic hydrocarbon may be substituted; two or more of Ra 01 to Ra 03 may be mutually bonded to form a cyclic structure; Yaa represents a carbon atom; Xaa represents a group which forms an aliphatic cyclic group together with Yaa; Ra 04 represents an aromatic hydrocarbon group which may have a substituent; Ra′ 12 and Ra′ 13 each independently represent a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, provided that part or all of the hydrogen atoms of the saturated hydrocarbon group may be substituted; Ra′ 14 represents an aromatic hydrocarbon group which may have a hydrogen atom substituted with a substituent; and * represents a bonding site;
wherein R 101 , R 104 and R 106 each independently represents a hydrocarbon group containing an aromatic ring which may have a substituent; R 105 , R 107 and R 108 each independently represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent or a chain alkenyl group which may have a substituent; R 102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; Y 101 represents a single bond or a divalent linking group containing an oxygen atom; V 101 to V 103 each independently represents a single bond, an alkylene group or a fluorinated alkylene group; L 101 and L 102 each independently represents a single bond or an oxygen atom; L 103 and L 105 each independently represents a single bond, —CO— or —SO 2 —; m represents an integer of 1 or more; and M′ m+ represents an m-valent onium cation.
2. The resist composition according to claim 1 , wherein the resin component (A1) further comprises a structural unit (a10) represented by general formula (a10-1) shown below:
wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya x1 represents a single bond or a divalent linking group; Wa x1 represents an aromatic hydrocarbon group having a valency of (n ax1 +1); and n ax1 represents an integer of 1 or more.
3. A method of forming a resist pattern, comprising:
forming a resist film on a substrate using a resist composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.
4. The resist pattern forming method according to claim 3 , wherein the resist film is exposed with extreme ultraviolet (EUV) or electron beam (EB).
5. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base component (A) which exhibits changed solubility in a developing solution under action of acid, and
an acid generator component (B) which generates acid upon exposure,
the base component (A) comprising a resin component (A1) comprising a structural unit (a0) represented by general formula (a0) shown below, and
the acid generator component (B) comprising at least one member selected from the group consisting of a compound (b-1) represented by general formula (b-1) shown below, a compound (b-2) represented by general formula (b-2) shown below and a compound (b-3) represented by general formula (b-3) shown below:
wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a group in which two hydrogen atoms have been removed from benzene, naphthalene, anthracene, phenanthrene, pyridine, thiophene, biphenyl or fluorene, provided that Wa may have a hydrogen atom substituted with a linear or branched alkyl group having 1 to 5 carbon atoms, a halogen atom, or a linear or branched halogenated alkyl group having 1 to 5 carbon atoms; Va 0 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; and Ra 00 is a group represented by general formula (a1-r2-1) shown below, a group represented by general formula (a1-r2-2) shown below, a group represented by general formula (a1-r2-3) shown below or a group represented by general formula (a1-r2-4) shown below:
wherein Ra′ 10 represents an alkyl group having 1 to 10 carbon atoms; Ra′ 11 is a group which forms an aliphatic cyclic group together with a carbon atom having Ra′ 10 bonded thereto, or a fused cyclic group in which an aromatic ring is fused with the alicyclic group; Ya represents a carbon atom; Xa represents a group which forms a monocyclic aliphatic hydrocarbon group together with Ya, provided that part or all of the hydrogen atoms of the monocyclic aliphatic hydrocarbon group may be substituted; Ra 01 to Ra 03 each independently represents a hydrogen atom, a monovalent saturated chain hydrocarbon group of 1 to 10 carbon atoms or a monovalent saturated aliphatic cyclic hydrocarbon group of 3 to 20 carbon atoms, provided that part or all of the hydrogen atoms of the saturated chain hydrocarbon or the saturated aliphatic cyclic hydrocarbon may be substituted; two or more of Ra 01 to Ra 03 may be mutually bonded to form a cyclic structure; Yaa represents a carbon atom; Xaa represents a group which forms an aliphatic cyclic group together with Yaa; Ra 04 represents an aromatic hydrocarbon group which may have a substituent; Ra′ 12 and Ra′ 13 each independently represent a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms, provided that part or all of the hydrogen atoms of the saturated hydrocarbon group may be substituted; Ra′ 14 represents an aromatic hydrocarbon group which may have a hydrogen atom substituted with a substituent; and * represents a bonding site;
wherein R 101 , R 104 and R 106 each independently represents a hydrocarbon group containing an aromatic ring which may have a substituent; R 105 , R 107 and R 108 each independently represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent or a chain alkenyl group which may have a substituent; R 102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; Y 101 represents a single bond or a divalent linking group containing an oxygen atom; V 101 to V 103 each independently represents a single bond, an alkylene group or a fluorinated alkylene group; L 101 and L 102 each independently represents a single bond or an oxygen atom; L 103 to L 105 each independently represents a single bond, —CO— or —SO 2 —; m represents an integer of 1 or more; and M′ m+ represents an m-valent onium cation.