IP Library Granted Patent US 11,275,307
Granted Patent B2
US 11,275,307 · App. 16/443,001 · Granted Mar 15, 2022

Resist composition, method of forming resist pattern, polymeric compound, and compound

Inventors: Masatoshi Arai (Kawasaki, JP); Takaya Maehashi (Kawasaki, JP); Koshi Onishi (Kawasaki, JP)
Assignee: Tokyo Ohka Kogyo Co., Ltd.
G03F7/0397C07C69/76C08F212/22C08F220/14C08F220/1812G03F7/0382G03F7/0392C07C2601/08C07C2601/14G03F7/162G03F7/168G03F7/2004G03F7/2037G03F7/322G03F7/38
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Quick Facts
Patent No.
US 11,275,307
App. No.
16/443,001
Granted
Mar 15, 2022
Kind
B2
Abstract

A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya 0 represents a carbon atom; Xa 0 represents a group which forms a cyclic hydrocarbon group together with Ya 0 ; Ra 00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa 0 and Ra 00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 0 .

Claims (25)

1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:

a resin component (A1) which exhibits changed solubility in a developing solution under action of acid,

the resin component (A1) comprising a structural unit (a0) represented by general formula (a0) shown below:

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 0 represents a carbon atom; Xa 0 represents a group which forms a cyclic hydrocarbon group together with Ya 0 , provided that part or all of the hydrogen atoms of the cyclic hydrocarbon group may be substituted with a substituent; Ra 00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa 0 and Ra 00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 0 .

2. The resist composition according to claim 1 , wherein the structural unit (a0) comprises at least one member selected from the group consisting of a structural unit (a0-1) represented by general formula (a0-1) shown below, a structural unit (a0-2) represented by general formula (a0-2) shown below and a structural unit (a0-3) represented by general formula (a0-3) shown below:

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 01 represents a carbon atom; Xa 01 represents a group which forms a saturated alicyclic hydrocarbon group together with Ya 01 ; provided that part or all of the hydrogen atoms of the saturated alicyclic hydrocarbon group may be substituted with a substituent; Ra 01 represents an aromatic hydrocarbon group which may have a substituent; provided that Ra 01 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 01 ;

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 02 represents a carbon atom; Xa 02 represents a group which forms a saturated alicyclic hydrocarbon group together with Ya 02 ; provided that part or all of the hydrogen atoms of the saturated alicyclic hydrocarbon group may be substituted with a substituent; Ra 02 to Ra 04 each independently represents a hydrogen atom, a monovalent saturated chain hydrocarbon group of 1 to 10 carbon atoms which may have a substituent, or a monovalent saturated cyclic hydrocarbon group of 3 to 20 carbon atoms which may have a substituent; provided that two or more of Ra 02 to Ra 04 may be mutually bonded to form a ring structure;

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 03 represents a carbon atom; Xa 03 represents a group which forms, together with Ya 03 , an unsaturated alicyclic hydrocarbon group or a condensed bicyclic group in which an aromatic ring is fused with an alicyclic hydrocarbon group; provided that part or all of the hydrogen atoms of the unsaturated alicyclic hydrocarbon group or the condensed bicyclic group may be substituted with a substituent; Ra 05 represents a linear or branched alkyl group; provided that Xa 03 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 03 .

3. A method of forming a resist pattern, comprising:

forming a resist film on a substrate using the resist composition according to claim 1 ;

exposing the resist film; and

developing the exposed resist film to form a resist pattern.

4. The resist pattern forming method according to claim 3 , wherein the resist film is exposed to extreme ultraviolet (EUV) or electron beam (EB).

5. A polymeric compound comprising a structural unit (a0) represented by general formula (a0) shown below:

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 0 represents a carbon atom; Xa 0 represents a group which forms a cyclic hydrocarbon group together with Ya 0 , provided that part or all of the hydrogen atoms of the cyclic hydrocarbon group may be substituted with a substituent; Ra 00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa 0 and Ra 00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 0 .

6. The polymeric compound according to claim 5 , wherein the structural unit (a0) comprises at least one member selected from the group consisting of a structural unit (a0-1) represented by general formula (a0-1) shown below, a structural unit (a0-2) represented by general formula (a0-2) shown below and a structural unit (a0-3) represented by general formula (a0-3) shown below:

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 01 represents a carbon atom; Xa 01 represents a group which forms a saturated alicyclic hydrocarbon group together with Ya 01 ; provided that part or all of the hydrogen atoms of the saturated alicyclic hydrocarbon group may be substituted with a substituent; Ra 01 represents an aromatic hydrocarbon group which may have a substituent; provided that Ra 01 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 01 ;

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 02 represents a carbon atom; Xa 02 represents a group which forms a saturated alicyclic hydrocarbon group together with Ya 02 ; provided that part or all of the hydrogen atoms of the saturated alicyclic hydrocarbon group may be substituted with a substituent; Ra 02 to Ra 04 each independently represents a hydrogen atom, a monovalent saturated chain hydrocarbon group of 1 to 10 carbon atoms which may have a substituent, or a monovalent saturated cyclic hydrocarbon group of 3 to 20 carbon atoms which may have a substituent; provided that two or more of Ra 02 to Ra 04 may be mutually bonded to form a ring structure;

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 03 represents a carbon atom; Xa 03 represents a group which forms, together with Ya 03 , an unsaturated alicyclic hydrocarbon group or a condensed bicyclic group in which an aromatic ring is fused with an alicyclic hydrocarbon group; provided that part or all of the hydrogen atoms of the unsaturated alicyclic hydrocarbon group or the condensed bicyclic group may be substituted with a substituent; Ra 05 represents a linear or branched alkyl group; provided that Xa 03 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 03 .

7. A compound represented by general formula (am0) shown below:

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 0 represents a carbon atom; Xa 0 represents a group which forms a cyclic hydrocarbon group together with Ya 0 , provided that part or all of the hydrogen atoms of the cyclic hydrocarbon group may be substituted with a substituent; Ra 00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa 0 and Ra 00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 0 .

8. The compound according to claim 7 , which comprises at least one member selected from the group consisting of a compound (am0-1) represented by general formula (am0-1) shown below, a compound (am0-2) represented by general formula (am0-2) shown below and a compound (am0-3) represented by general formula (am0-3) shown below:

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 01 represents a carbon atom; Xa 01 represents a group which forms a saturated alicyclic hydrocarbon group together with Ya 01 ; provided that part or all of the hydrogen atoms of the saturated alicyclic hydrocarbon group may be substituted with a substituent; Ra 01 represents an aromatic hydrocarbon group which may have a substituent; provided that Ra 01 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 01 ;

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 02 represents a carbon atom; Xa 02 represents a group which forms a saturated alicyclic hydrocarbon group together with Ya 02 ; provided that part or all of the hydrogen atoms of the saturated alicyclic hydrocarbon group may be substituted with a substituent; Ra 02 to Ra 04 each independently represents a hydrogen atom, a monovalent saturated chain hydrocarbon group of 1 to 10 carbon atoms which may have a substituent, or a monovalent saturated cyclic hydrocarbon group of 3 to 20 carbon atoms which may have a substituent; provided that two or more of Ra 02 to Ra 04 may be mutually bonded to form a ring structure;

wherein R 0 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va x0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Va x1 represents a divalent hydrocarbon group which may have an ether bond; n a0 represents an integer of 0 to 2; Ya 03 represents a carbon atom; Xa 03 represents a group which forms, together with Ya 03 , an unsaturated alicyclic hydrocarbon group or a condensed bicyclic group in which an aromatic ring is fused with an alicyclic hydrocarbon group; provided that part or all of the hydrogen atoms of the unsaturated alicyclic hydrocarbon group or the condensed bicyclic group may be substituted with a substituent; Ra 05 represents a linear or branched alkyl group; provided that Xa 03 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya 03 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2019
From: ARAI, MASATOSHI; MAEHASHI, TAKAYA; ONISHI, KOSHI
To: TOKYO OHKA KOGYO CO., LTD.
Reel/Frame 049599/0477 →
Priority Claims (1)
JP JP2018-115624 · Jun 18, 2018 · national
Continuity (1)
Related Publication 20190384175A1 · Dec 19, 2019
Cited By (2)
US 12,411,408 US 12,449,729