Resistance element and manufacturing method of resistance element
Provided is a resistance element, including: a semiconductor substrate; a first insulating film stacked on the semiconductor substrate; a resistance layer selectively stacked on the first insulating film; a first auxiliary film separated from the resistance layer; a second auxiliary film separated from the resistance layer in a direction different from that of the first auxiliary film; a second insulating film stacked on the first insulating film to cover the resistance layer, and the first auxiliary film and the second auxiliary film; a first electrode connected to the resistance layer and stacked on the second insulating film disposed on an upper side of the first auxiliary film; and a second electrode connected to the resistance layer by being separated from the first electrode and stacked on the second insulating film on the upper side of the second auxiliary film.
1. A resistance element, comprising:
a semiconductor substrate;
a first insulating film stacked on the semiconductor substrate;
a resistance layer selectively stacked on the first insulating film;
a first auxiliary film separated from the resistance layer;
a second auxiliary film separated from the resistance layer in a direction different from a direction of the first auxiliary film, the first and second auxiliary films being conductive films;
a second insulating film stacked on the first insulating film, the resistance layer, and the first auxiliary film and the second auxiliary film;
a first electrode connected to the resistance layer and stacked on a first portion of the second insulating film disposed on an upper side of the first auxiliary film, such that the first electrode and the first auxiliary film are insulated from each other; and
a second electrode connected to the resistance layer, separated from the first electrode, and stacked on a second portion of the second insulating film on an upper side of the second auxiliary film, such that the second electrode and the second auxiliary film are insulated from each other.
2. The resistance element according to claim 1 ,
wherein the first auxiliary film and the second auxiliary film are made of a material identical to a material of the resistance layer.
3. The resistance element according to claim 1 ,
wherein the second insulating film is provided on the first insulating film, the resistance layer, the first auxiliary film, and the second auxiliary film, and provided between the resistance layer and the first auxiliary film, and between the resistance layer and the second auxiliary film, such that the resistance layer, the first auxiliary film and the second auxiliary film are insulated from each other.