IP Library Granted Patent US 10,825,831
Granted Patent B1
US 10,825,831 · App. 16/457,694 · Granted Nov 3, 2020

Non-volatile memory with storage nodes having a radius of curvature

Inventors: Randy J. Koval (Boise, ID); Henok T. Mebrahtu (Meridian, ID); Krishna K. Parat (Palo Alto, CA)
Assignee: Intel Corporation
H01L27/11582H01L21/0262H01L21/02164H01L21/02271H01L21/02532H01L21/02595H01L21/02636H01L21/31111H01L21/32133H01L27/11556H01L29/40114H01L29/40117H01L29/4234H01L29/42324
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Quick Facts
Patent No.
US 10,825,831
App. No.
16/457,694
Granted
Nov 3, 2020
Kind
B1
Abstract

Storage node configurations are described. A storage node (e.g., a floating gate or a charge trap layer of a three-dimensional (3D) NAND flash device) include a channel-facing surface with a radius of curvature. For example, a channel-facing surface of the storage node may be concave. A control gate-facing surface of the storage node may instead, or additionally, also include a radius of curvature. The radius of curvature of the channel-facing and/or control gate-facing surfaces of the storage node is less than or equal to the radius of the channel layer.

Claims (50)

1. An integrated circuit comprising:

a filled hole in a substrate, the filled hole including a semiconductor channel film;

a storage node surrounding the semiconductor channel film, the storage node having a radius of curvature, wherein the radius of curvature of the storage node is less than or equal to a radius of the semiconductor channel film; and

a control gate surrounding the storage node.

2. The integrated circuit of claim 1 , wherein:

a channel-facing side of the storage node includes a concave surface with the radius of curvature.

3. The integrated circuit of claim 1 , wherein:

a storage node-facing side of the semiconductor channel film includes a convex surface.

4. The integrated circuit of claim 2 , wherein:

the radius of the semiconductor channel film comprises a smallest radius of the semiconductor channel film; and

the radius of curvature of the concave surface on the channel-facing side of the storage node is less than the smallest radius of the semiconductor channel film.

5. The integrated circuit of claim 1 , wherein:

the storage node comprises a floating gate having the radius of curvature.

6. The integrated circuit of claim 5 , wherein:

a channel-facing side of the floating gate includes a concave surface with the radius of curvature.

7. The integrated circuit of claim 6 , wherein:

a control gate-facing side of the floating gate includes a concave surface with a second radius of curvature.

8. The integrated circuit of claim 7 , wherein:

the second radius of curvature is less than or equal to the radius of the semiconductor channel film.

9. The integrated circuit of claim 5 , wherein:

a storage node-facing side of the control gate includes a convex surface.

10. The integrated circuit of claim 5 , wherein:

a control gate-facing side of the floating gate includes a flat surface.

11. The integrated circuit of claim 5 , wherein:

the floating gate includes tapered upper and lower edges between a channel-facing side and a control gate-facing side of the floating gate; and

wherein a height of the floating gate is greater at the channel-facing side than at the control gate-facing side.

12. The integrated circuit of claim 11 , wherein:

the tapered upper and lower edges form a multi-faceted control gate-facing side of the floating gate.

13. The integrated circuit of claim 5 , wherein:

the floating gate includes non-tapered upper and lower edges between a channel-facing side and a control-gate facing side of the floating gate.

14. The integrated circuit of claim 1 , wherein:

the storage node comprises a charge trap layer having the radius of curvature.

15. The integrated circuit of claim 14 , wherein:

the charge trap layer is continuous between vertically adjacent cells.

16. The integrated circuit of claim 14 , wherein:

the charge trap layer is isolated from charge trap layers of vertically adjacent cells.

17. The integrated circuit of claim 1 , further comprising:

a plurality of vertically stacked NAND memory cells around the semiconductor channel film, the plurality of vertically stacked NAND memory cells having storage nodes with differing radiuses of curvature.

18. A non-volatile storage device comprising:

an array of NAND memory cells, a cell of the array including:

a storage node around a semiconductor channel film, the storage node including a radius of curvature that is less than or equal to a radius of the semiconductor channel film; and

control circuitry to access the array of NAND memory cells.

19. The non-volatile storage device of claim 18 , wherein:

a channel-facing side of the storage node includes a concave surface with the radius of curvature.

20. A system comprising:

a processor; and

a non-volatile storage device coupled with the processor, the non-volatile storage device comprising an array of NAND memory cells, a cell of the array including:

a storage node around a semiconductor channel film, the storage node including a radius of curvature that is less than or equal to a radius of the semiconductor channel film.

21. The system of claim 20 , wherein:

the non-volatile storage device comprises a NAND flash solid state drive (SSD) or a dual inline memory module (DIMM).

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2023
From: INTEL CORPORATION
To: INTEL NDTM US LLC
Reel/Frame 064928/0832 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 6, 2019
From: KOVAL, RANDY J.; MEBRAHTU, HENOK T.; PARAT, KRISHNA K.
To: INTEL CORPORATION
Reel/Frame 049970/0019 →